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Front Matter: Volume 12495 封面:第12495卷
DTCO and Computational Patterning II Pub Date : 2023-05-24 DOI: 10.1117/12.2684473
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引用次数: 0
A Synopsys TCAD-based workflow to support technology evaluation at 3nm and beyond 基于新思tcad的工作流程，支持3nm及以上的技术评估
DTCO and Computational Patterning II Pub Date : 2023-04-30 DOI: 10.1117/12.2658572
R. Robison, Janet M. Wilson, R. Vega, Terence Hook, F. Geelhaar, Jonathan Cobb, Tim Tsuei
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引用次数: 0
Training data selection and optimization for EUV lithography deep learning models EUV光刻深度学习模型的训练数据选择与优化
DTCO and Computational Patterning II Pub Date : 2023-04-30 DOI: 10.1117/12.2658411
Abdalaziz Awad, Philipp Brendel, Bappaditya Dey, S. Halder, A. Erdmann
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引用次数: 0
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