PhotonicsViews最新文献

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Ultraviolet line structuring of large solar wafers 大型太阳能晶片的紫外线线构造
PhotonicsViews Pub Date : 2024-11-03 DOI: 10.1002/phvs.202400035
Henrike Schlutow, Ulrike Fuchs, Claudia Reinlein
{"title":"Ultraviolet line structuring of large solar wafers","authors":"Henrike Schlutow,&nbsp;Ulrike Fuchs,&nbsp;Claudia Reinlein","doi":"10.1002/phvs.202400035","DOIUrl":"https://doi.org/10.1002/phvs.202400035","url":null,"abstract":"<p>Ultrashort-pulsed lasers are ideal for material processing by welding, marking, and cutting. Scanning systems are crucial for large substrates. We introduce a novel UV line structuring method using deformable mirror technology and freeform optics. This approach aims to improve processing times on large substrates, especially for M12 solar wafer processing. By using a freeform lens and a Zwobbel deformable mirror, we achieve extended processing fields and high scan frequencies. The paper explores optical designs, their robust optomechanical implementation for prototyping, and setup characterization.</p>","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"21 5","pages":"57-61"},"PeriodicalIF":0.0,"publicationDate":"2024-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202400035","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142573957","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
PARMS coating technology for UV to IR laser applications 用于紫外至红外激光应用的 PARMS 涂层技术
PhotonicsViews Pub Date : 2024-11-03 DOI: 10.1002/phvs.202470515
{"title":"PARMS coating technology for UV to IR laser applications","authors":"","doi":"10.1002/phvs.202470515","DOIUrl":"https://doi.org/10.1002/phvs.202470515","url":null,"abstract":"<p>Reactive sputtering using a medium frequency (MF) dual magnetron source is an advanced technique widely employed in various thin film deposition applications. For the production of high-quality optical filters based on oxides with low losses, it is crucial to exclude any form of arcing, including both strong arcs and microarcs. These requirements are solved by plasmaassisted reactive magnetron sputtering (PARMS), which also provides a high deposition rate contributing to the economically efficient production of high-end optical filters.</p>","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"21 5","pages":"56"},"PeriodicalIF":0.0,"publicationDate":"2024-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202470515","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142574018","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
SiC high-tech ceramics — a comparison of laser processes 碳化硅高科技陶瓷--激光工艺比较
PhotonicsViews Pub Date : 2024-11-03 DOI: 10.1002/phvs.202400038
Christian Rochholz, Andreas Meudtner
{"title":"SiC high-tech ceramics — a comparison of laser processes","authors":"Christian Rochholz,&nbsp;Andreas Meudtner","doi":"10.1002/phvs.202400038","DOIUrl":"https://doi.org/10.1002/phvs.202400038","url":null,"abstract":"<p>Extensive R&amp;D applied various laser sources — from nanosecond VIS-wavelength to femtosecond IR and water-jet guided lasers — to enhance the quality and efficiency of laser structuring, fine cutting, and drilling of silicon carbide. Tests focused on surface roughness, cutting line precision, and high ablation rates. Challenges due to diverse material compositions, like diamond layers, required combined methods to develop viable approaches. To meet economic constraints, mechanical grinding was integrated with recurring laser processing.</p>","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"21 5","pages":"48-51"},"PeriodicalIF":0.0,"publicationDate":"2024-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202400038","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142573956","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Products: PhotonicsViews 5/2024 产品:PhotonicsViews 5/2024
PhotonicsViews Pub Date : 2024-11-03 DOI: 10.1002/phvs.202470504
{"title":"Products: PhotonicsViews 5/2024","authors":"","doi":"10.1002/phvs.202470504","DOIUrl":"https://doi.org/10.1002/phvs.202470504","url":null,"abstract":"","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"21 5","pages":"11"},"PeriodicalIF":0.0,"publicationDate":"2024-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202470504","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142574050","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Organizations & Initiatives: PhotonicsViews 5/2024 组织与倡议:PhotonicsViews 5/2024
PhotonicsViews Pub Date : 2024-11-03 DOI: 10.1002/phvs.202470506
{"title":"Organizations & Initiatives: PhotonicsViews 5/2024","authors":"","doi":"10.1002/phvs.202470506","DOIUrl":"https://doi.org/10.1002/phvs.202470506","url":null,"abstract":"","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"21 5","pages":"18-21"},"PeriodicalIF":0.0,"publicationDate":"2024-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202470506","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142574071","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Industrial-grade 2-μm ultrafast fiber laser CPA for silicon processing 用于硅加工的工业级 2 微米超快光纤激光器 CPA
PhotonicsViews Pub Date : 2024-11-03 DOI: 10.1002/phvs.202400036
Christian Gaida, Tobias Heuermann, Sven Breitkopf, Tino Eidam, Jens Limpert
{"title":"Industrial-grade 2-μm ultrafast fiber laser CPA for silicon processing","authors":"Christian Gaida,&nbsp;Tobias Heuermann,&nbsp;Sven Breitkopf,&nbsp;Tino Eidam,&nbsp;Jens Limpert","doi":"10.1002/phvs.202400036","DOIUrl":"https://doi.org/10.1002/phvs.202400036","url":null,"abstract":"<p>A novel compact laser utilizing thulium-based fiber chirped-pulse amplification (CPA) technology has been developed to enable essential tasks such as microwelding or the precision cutting of filaments with semiconductors such as silicon. At a central wavelength of 2 μm, the activeTwo-15 provides pulse energies exceeding 100 μJ and an average power output surpassing 15 W, and can be seamlessly integrated into systems for materials processing.</p>","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"21 5","pages":"44-47"},"PeriodicalIF":0.0,"publicationDate":"2024-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202400036","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142573960","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Dielectric material processing with ultrashort pulses 利用超短脉冲加工电介质材料
PhotonicsViews Pub Date : 2024-11-03 DOI: 10.1002/phvs.202400040
Deividas Andriukaitis, Mantvydas Jašinskas, Paulius Gečys, Christian Bischoff
{"title":"Dielectric material processing with ultrashort pulses","authors":"Deividas Andriukaitis,&nbsp;Mantvydas Jašinskas,&nbsp;Paulius Gečys,&nbsp;Christian Bischoff","doi":"10.1002/phvs.202400040","DOIUrl":"https://doi.org/10.1002/phvs.202400040","url":null,"abstract":"<p>Femtosecond lasers have become essential tools in material processing. Thanks to their ultrashort pulse duration, these lasers can process a wide range of materials without causing significant thermal effects, leading to superior quality. Dielectric materials, especially glass and ceramics, are among those that benefit the most from femtosecond laser technology. Traditional processing methods often struggle with these materials, but femtosecond lasers provide a solution with high precision and quality.</p>","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"21 5","pages":"52-56"},"PeriodicalIF":0.0,"publicationDate":"2024-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202400040","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142574017","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Contents: PhotonicsViews 5/2024 内容PhotonicsViews 5/2024
PhotonicsViews Pub Date : 2024-11-03 DOI: 10.1002/phvs.202470502
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引用次数: 0
News: PhotonicsViews 5/2024 新闻:PhotonicsViews 5/2024
PhotonicsViews Pub Date : 2024-11-03 DOI: 10.1002/phvs.202470503
{"title":"News: PhotonicsViews 5/2024","authors":"","doi":"10.1002/phvs.202470503","DOIUrl":"https://doi.org/10.1002/phvs.202470503","url":null,"abstract":"","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"21 5","pages":"4"},"PeriodicalIF":0.0,"publicationDate":"2024-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202470503","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142574049","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Cover Picture: PhotonicsViews 5/2024 封面图片:PhotonicsViews 5/2024
PhotonicsViews Pub Date : 2024-11-03 DOI: 10.1002/phvs.202470500
{"title":"Cover Picture: PhotonicsViews 5/2024","authors":"","doi":"10.1002/phvs.202470500","DOIUrl":"https://doi.org/10.1002/phvs.202470500","url":null,"abstract":"","PeriodicalId":101021,"journal":{"name":"PhotonicsViews","volume":"21 5","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/phvs.202470500","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142574084","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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