Nanotechnology and Precision Engineering最新文献

{"title":"One-step synthesis of B and N co-doped carbon nanotubes for high-stability lithium-ion batteries","authors":"Huan Huan, Chengxiang Tian, Shuangyue Wang, Q. Feng, H. Deng, Xiang Xia, Xiaotao Zu","doi":"10.1063/10.0026319","DOIUrl":"https://doi.org/10.1063/10.0026319","url":null,"abstract":"Creating adsorption sites by doping heteroatoms into the graphitic structures of carbon electrodes is an effective strategy for improving lithium storage in lithium-ion batteries. In this work, we prepared carbon nanotubes with controllable morphology and controllable nitrogen-doping level by a one-step pyrolysis method through adjusting the amount of urea used during synthesis. Under the synergistic effects of high temperature and Ni-catalyst migration, the carbon nanosheets generated by pyrolysis become coiled into tube-like structures. Characterization using Raman and x-ray photoelectron spectroscopy revealed that the B and N atoms were successfully co-doped into the resultant carbon nanotubes. When the obtained materials were used as lithium-ion battery anodes, reversible specific capacities of 337.11 and 187.62 mA h g−1 were achieved at current densities of 100 and 2000 mA g−1, respectively. Moreover, a capacity of 140.53 mA h g−1 was retained after 2000 cycles at a current density of 2000 mA g−1. The mechanism of lithium storage in these carbon materials was elucidated using cyclic voltammetry tests. Regarding other functional applications, the synthesized composite carbon nanotube material could also be used in other energy-storage battery systems, such as in the sulfur-carrying structures of lithium-sulfur batteries and in the three-dimensional porous structures of sodium batteries.","PeriodicalId":506091,"journal":{"name":"Nanotechnology and Precision Engineering","volume":"35 2","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141338282","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Failure behavior of tantalum electrolytic capacitors under extreme dynamic impact: Mechanical–electrical model and microscale characterization","authors":"Xiangyu Han, Da Yu, Cheng Chen, Keren Dai","doi":"10.1063/10.0026017","DOIUrl":"https://doi.org/10.1063/10.0026017","url":null,"abstract":"Tantalum electrolytic capacitors have performance advantages of long life, high temperature stability, and high energy storage capacity and are essential micro-energy storage devices in many pieces of military mechatronic equipment, including penetration weapons. The latter are high-value ammunition used to strike strategic targets, and precision in their blast point is ensured through the use of penetration fuzes as control systems. However, the extreme dynamic impact that occurs during penetration causes a surge in the leakage current of tantalum capacitors, resulting in a loss of ignition energy, which can lead to ammunition half-burst or even sometimes misfire. To address the urgent need for a reliable design of tantalum capacitor for penetration fuzes, in this study, the maximum acceptable leakage current of a tantalum capacitor during impact is calculated, and two different types of tantalum capacitors are tested using a machete hammer. It is found that the leakage current of tantalum capacitors increases sharply under extreme impact, causing functional failure. Considering the piezoresistive effect of the tantalum capacitor dielectric and the changes in the contact area between the dielectric and the negative electrode under pressure, a force–electric simulation model at the microscale is established in COMSOL software. The simulation results align favorably with the experimental results, and it is anticipated that the leakage current of a tantalum capacitor will experience exponential growth with increasing pressure, ultimately culminating in complete failure according to this model. Finally, the morphological changes in tantalum capacitor sintered cells both without pressure and under pressure are characterized by electron microscopy. Broken particles of Ta–Ta2O5 sintered molecular clusters are observed under pressure, together with cracks in the MnO2 negative base, proving that large stresses and strains are generated at the micrometer scale.","PeriodicalId":506091,"journal":{"name":"Nanotechnology and Precision Engineering","volume":"49 47","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141384273","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Real-time generation of circular patterns in electron beam lithography","authors":"Zhengjie Li, Bohua Yin, Botong Sun, Jingyu Huang, Pengfei Wang, Li Han","doi":"10.1063/10.0025757","DOIUrl":"https://doi.org/10.1063/10.0025757","url":null,"abstract":"Electron beam lithography (EBL) involves the transfer of a pattern onto the surface of a substrate by first scanning a thin layer of organic film (called resist) on the surface by a tightly focused and precisely controlled electron beam (exposure) and then selectively removing the exposed or nonexposed regions of the resist in a solvent (developing). It is widely used for fabrication of integrated circuits, mask manufacturing, photoelectric device processing, and other fields. The key to drawing circular patterns by EBL is the graphics production and control. In an EBL system, an embedded processor calculates and generates the trajectory coordinates for movement of the electron beam, and outputs the corresponding voltage signal through a digital-to-analog converter (DAC) to control a deflector that changes the position of the electron beam. Through this procedure, it is possible to guarantee the accuracy and real-time control of electron beam scanning deflection. Existing EBL systems mostly use the method of polygonal approximation to expose circles. A circle is divided into several polygons, and the smaller the segmentation, the higher is the precision of the splicing circle. However, owing to the need to generate and scan each polygon separately, an increase in the number of segments will lead to a decrease in the overall lithography speed. In this paper, based on Bresenham’s circle algorithm and exploiting the capabilities of a field-programmable gate array and DAC, an improved real-time circle-producing algorithm is designed for EBL. The algorithm can directly generate circular graphics coordinates such as those for a single circle, solid circle, solid ring, or concentric ring, and is able to effectively realizes deflection and scanning of the electron beam for circular graphics lithography. Compared with the polygonal approximation method, the improved algorithm exhibits improved precision and speed. At the same time, the point generation strategy is optimized to solve the blank pixel and pseudo-pixel problems that arise with Bresenham’s circle algorithm. A complete electron beam deflection system is established to carry out lithography experiments, the results of which show that the error between the exposure results and the preset patterns is at the nanometer level, indicating that the improved algorithm meets the requirements for real-time control and high precision of EBL.","PeriodicalId":506091,"journal":{"name":"Nanotechnology and Precision Engineering","volume":"113 10","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141105953","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Feedback linearization and equivalent-disturbance compensation control strategy for piezoelectric stage","authors":"Tao Huang, Yingbin Wang, Zhihong Luo, Huajun Cao, Guibao Tao, Mingxiang Ling","doi":"10.1063/10.0024700","DOIUrl":"https://doi.org/10.1063/10.0024700","url":null,"abstract":"Piezoelectric stages use piezoelectric actuators and flexure hinges as driving and amplifying mechanisms, respectively. These systems have high positioning accuracy and high-frequency responses, and they are widely used in various precision/ultra-precision positioning fields. However, the main challenge with these devices is the inherent hysteresis nonlinearity of piezoelectric actuators, which seriously affects the tracking accuracy of a piezoelectric stage. Inspired by this challenge, in this work, we developed a Hammerstein model to describe the hysteresis nonlinearity of a piezoelectric stage. In particular, in our proposed scheme, a feedback-linearization algorithm is used to eliminate the static hysteresis nonlinearity. In addition, a composite controller based on equivalent-disturbance compensation was designed to counteract model uncertainties and external disturbances. An analysis of the stability of a closed-loop system based on this feedback-linearization algorithm and composite controller was performed, and this was followed by extensive comparative experiments using a piezoelectric stage developed in the laboratory. The experimental results confirmed that the feedback-linearization algorithm and the composite controller offer improved linearization and trajectory-tracking performance.","PeriodicalId":506091,"journal":{"name":"Nanotechnology and Precision Engineering","volume":"53 3","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-02-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140430825","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Patterning single-layer materials by electrical breakdown using atomic force microscopy","authors":"Yajie Yang, Jiajia Lu, Yanbo Xie, Libing Duan","doi":"10.1063/10.0023848","DOIUrl":"https://doi.org/10.1063/10.0023848","url":null,"abstract":"The development of nanoelectronics and nanotechnologies has been boosted significantly by the emergence of 2D materials because of their atomic thickness and peculiar properties, and developing a universal, precise patterning technology for single-layer 2D materials is critical for assembling nanodevices. Demonstrated here is a nanomachining technique using electrical breakdown by an AFM tip to fabricate nanopores, nanostrips, and other nanostructures on demand. This can be achieved by voltage scanning or applying a constant voltage while moving the tip. By measuring the electrical current, the formation process on single-layer materials was shown quantitatively. The present results provide evidence of successful pattern fabrication on single-layer MoS2, boron nitride, and graphene, although further confirmation is still needed. The proposed method holds promise as a general nanomachining technology for the future.","PeriodicalId":506091,"journal":{"name":"Nanotechnology and Precision Engineering","volume":"86 4","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-12-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139157307","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Investigation of high-quality-factor aluminum nitride MEMS cantilever resonators","authors":"Shuai Shi, Qingrui Yang, Yi Yuan, Haolin Li, Pengfei Niu, Wenlan Guo, Chen Sun, Wei Pang","doi":"10.1063/10.0022173","DOIUrl":"https://doi.org/10.1063/10.0022173","url":null,"abstract":"This paper presents the design, fabrication, and characterization of cantilever-type resonators with a novel stacked structure. Aluminum nitride is adopted as the material for both the structural layer and the piezoelectric layer; this simplifies the fabrication process and improves the quality factor of the resonator. Both in-plane and out-of-plane flexural modes were investigated. The effect of the structural dimensions and electrode patterns on the resonator’s performance were also studied. Finite-element simulations and experiments examining anchor loss and thermoelastic damping, which are the main loss mechanisms affecting the quality factor of these resonators, were carried out. The optimal structural dimensions and electrode patterns of the cantilever-type resonators are presented. A quality factor of 7922 with a motional impedance of 88.52 kΩ and a quality factor of 8851 with a motional impedance of 67.03 kΩ were achieved for the in-plane and out-of-plane flexural-mode resonators, respectively. The proposed resonator design will contribute to the development of high-performance devices such as accelerometers, gyroscopes, and pressure sensors.","PeriodicalId":506091,"journal":{"name":"Nanotechnology and Precision Engineering","volume":"40 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-11-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139232718","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Flexible capacitive pressure sensor based on interdigital electrodes with porous microneedle arrays for physiological signal monitoring","authors":"Jiahui Xu, Minghao Wang, Minyi Jin, Siyan Shang, Chuner Ni, Yili Hu, Xun Sun, Jun Xu, Bowen Ji, Le Li, Yuhua Cheng, Gaofeng Wang","doi":"10.1063/10.0022174","DOIUrl":"https://doi.org/10.1063/10.0022174","url":null,"abstract":"Flexible pressure sensors have many potential applications in the monitoring of physiological signals because of their good biocompatibility and wearability. However, their relatively low sensitivity, linearity, and stability have hindered their large-scale commercial application. Herein, a flexible capacitive pressure sensor based on an interdigital electrode structure with two porous microneedle arrays (MNAs) is proposed. The porous substrate that constitutes the MNA is a mixed product of polydimethylsiloxane and NaHCO3. Due to its porous and interdigital structure, the maximum sensitivity (0.07 kPa−1) of a porous MNA-based pressure sensor was found to be seven times higher than that of an imporous MNA pressure sensor, and it was much greater than that of a flat pressure sensor without a porous MNA structure. Finite-element analysis showed that the interdigital MNA structure can greatly increase the strain and improve the sensitivity of the sensor. In addition, the porous MNA-based pressure sensor was found to have good stability over 1500 loading cycles as a result of its bilayer parylene-enhanced conductive electrode structure. Most importantly, it was found that the sensor could accurately monitor the motion of a finger, wrist joint, arm, face, abdomen, eye, and Adam’s apple. Furthermore, preliminary semantic recognition was achieved by monitoring the movement of the Adam’s apple. Finally, multiple pressure sensors were integrated into a 3 × 3 array to detect a spatial pressure distribution. Compared to the sensors reported in previous works, the interdigital electrode structure presented in this work improves sensitivity and stability by modifying the electrode layer rather than the dielectric layer.","PeriodicalId":506091,"journal":{"name":"Nanotechnology and Precision Engineering","volume":"2 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139255346","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Experiment on inducing apoptosis of melanoma cells by micro-plasma jet","authors":"Hua Li, Qihao Shi, Yanhua Yang, Jinghao Qi, Yuhan Zhang, Fengyun Wang, Xiaoxia Du, Wenxiang Xiao","doi":"10.1063/10.0022239","DOIUrl":"https://doi.org/10.1063/10.0022239","url":null,"abstract":"As a promising cancer treatment method, cold atmospheric plasma has received widespread attention in recent years. However, previous research has focused more on how to realize and expand the anti-cancer scope of plasma jet. There are also studies on the killing of small-scale cancer cells, but the effects of plasma jet on normal cells and normal cell clusters have been ignored. Therefore, we proposed a 50 µm sized micro-plasma jet device, and used the device to treat melanoma cells (A-375) and human glial cells (HA1800) to evaluate their anti-cancer effects and effects on normal cells. The experimental results show that this kind of micro-plasma jet device can effectively inactivate cancer cells in a short period of time, while having little effect on normal cells. This work provides a certain experimental basis for the application of fine plasma jet to clinically inactivate cancer cells.","PeriodicalId":506091,"journal":{"name":"Nanotechnology and Precision Engineering","volume":"64 4","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139272268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}