{"title":"Front Matter: Volume 11109","authors":"","doi":"10.1117/12.2551651","DOIUrl":"https://doi.org/10.1117/12.2551651","url":null,"abstract":"","PeriodicalId":244870,"journal":{"name":"Advances in Metrology for X-Ray and EUV Optics VIII","volume":"76 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116354803","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Nami Nakamura, S. Matsuyama, Takato Inoue, I. Inoue, T. Osaka, Y. Inubushi, M. Yabashi, T. Ishikawa, K. Yamauchi
{"title":"Beam size measurement for XFEL nanobeam using intensity interferometer of x-ray fluorescence (Conference Presentation)","authors":"Nami Nakamura, S. Matsuyama, Takato Inoue, I. Inoue, T. Osaka, Y. Inubushi, M. Yabashi, T. Ishikawa, K. Yamauchi","doi":"10.1117/12.2532283","DOIUrl":"https://doi.org/10.1117/12.2532283","url":null,"abstract":"Tight XFEL focusing is very important for significantly enhancing photon flux density, which is highly demanded by users exploring nonlinear X-ray optics. However, focusing XFEL down to 10 nm or less is so difficult from the viewpoints of both optical fabrication and optical alignment. The former can be overcome using techniques of wavefront sensing and fine shape correction. For the latter, techniques for directly measuring beam size on the focus without an influence of vibration of nanobeam are required. We have developed a technique for determining the size of nanobeam on the focus using an intensity interferometer, based on the Hanbury Brown and Twiss effect, of X-ray fluorescence emitted from a thin film inserted into the focus. The spatial coherence of X-ray fluorescence observed far from the focus depends on the distance from the focus and emission region of X-ray fluorescence. Therefore, the measured coherence can determine the size of X-ray nanobeam. This method has advantages that vibration of nanobeam does not affect the result and the setup is so simple.\u0000A demonstration experiment was performed using a 100 nm focusing system based on total reflection KB mirrors at SACLA. X-ray fluorescence (8 keV) emitted from a thin Cu film by irradiation of focused XFEL pulses (12 keV) was detected shot-by-shot with a dual MPCCD. Analyses of approximately 1000 images based on the autocorrelation revealed that the beam size obtained with this method is in good agreement with one obtained with the wire scan method.","PeriodicalId":244870,"journal":{"name":"Advances in Metrology for X-Ray and EUV Optics VIII","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123674048","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Shang-Wei Lin, Duan-Jen Wang, C. Hua, H. Fung, M. Hsu, G. Yin
{"title":"Slope error correction of bendable gratings with an in-situ long trace profiler for the soft x-ray beamline at National Synchrotron Radiation Research Center (NSRRC) (Conference Presentation)","authors":"Shang-Wei Lin, Duan-Jen Wang, C. Hua, H. Fung, M. Hsu, G. Yin","doi":"10.1117/12.2528382","DOIUrl":"https://doi.org/10.1117/12.2528382","url":null,"abstract":"To achieve an ultrahigh resolution for soft X-ray beamlines at Taiwan Photon Source (TPS), the slope error of a highly precise grating is required on level of 0.1 μrad (rms) under thermal loading with various curvatures. On the beamline, some optics are usually operating under high power density from undulator magnet, the thermal load will introduce a thermal bump on the optics profile and degrade the beamline performance, such as energy resolution and beam size. \u0000To realize the high resolution goal, a specially designed bender with 25 actuators for the grating is designed and a In situ long trace profiler (LTP) with precision of 0.1 μrad (rms) has been developed to measure the mirror profile in soft X-ray beamlines.\u0000This article introduces the design and construction of in situ LTP. It can provide a feedback guideance for the adjustment of actuators of bender mechanism to achieve the optium profile. A suitable adjustment procedure from the input of in-situ LTP , performance of bender and energy spectrums are presented.\u0000There are several benders as the active mirrors and active gratings in operation in TPS 41A resonant inelastic X-ray scattering (RIXS) and TPS 45A angle-resolved photoemission spectroscopy (ARPES) beamlines. In the meantime, three in situ LTPs have been developed to monitor the grating profile under the thermal load in the beamlines. They are providing a feedback to measure the surface figure and to find the optimal surface profile. They would increase our efficiency to reach the energy resolving power of 35,000 and 28,000 in the RIXS and ARPES beamlines, respectively.","PeriodicalId":244870,"journal":{"name":"Advances in Metrology for X-Ray and EUV Optics VIII","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127814354","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Stitching interferometry for synchrotron mirror metrology at NSLS-II (Conference Presentation)","authors":"Lei Huang, Tianyi Wang, K. Tayabaly, M. Idir","doi":"10.1117/12.2526502","DOIUrl":"https://doi.org/10.1117/12.2526502","url":null,"abstract":"With the progressive development in synchrotron radiation facilities and free electron lasers (FELs), the requirement of the X-ray mirror is getting higher with tighter specifications. It challenges the X-ray mirror metrology in two major application scenes. On one hand, a reliable mirror measurement technique is needed to provide trustable feedback to the deterministic polishing in mirror fabrication or re-polishing process. On the other hand, it demands a more accurate mirror metrology technique to offer better services for the X-ray mirror inspection at synchrotrons and FELs to control the quality of X-ray mirrors to be installed into beamlines. \u0000Since the stitching interferometry can provide two-dimensional laterally extendable (stitched) results with sub-nanometer height resolution and precision, several stitching interferometric techniques are studied for synchrotron mirror metrology. It is not only to enhance the mirror inspection capability in NSLS-II optical metrology laboratory but also to act in concert with the ongoing ion beam figuring project at NSLS-II. Various stitching methods with different stitching parameters are investigated at our stitching interferometric platform. Some experimental results are revealed to demonstrate the validity and performance of the developed system and stitching methods.","PeriodicalId":244870,"journal":{"name":"Advances in Metrology for X-Ray and EUV Optics VIII","volume":"144 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133453802","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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