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1983 Symposium on VLSI Technology. Digest of Technical Papers最新文献

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SiO2 Planarization by Two Step RF Bias Sputtering 两步射频偏压溅射制备SiO2的研究
1983 Symposium on VLSI Technology. Digest of Technical Papers Pub Date : 1983-09-01 DOI: 10.1116/1.583116
M. Morimoto, T. Mogami, H. Okabayashi, E. Nagasawa
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引用次数: 31
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