IF 17.9 2区材料科学

Nano Materials Science Pub Date : 2025-08-01 DOI: 10.1016/j.nanoms.2024.05.015

Xufeng Zhang , Kaiqing Zhao , Zongshuai He , Jiahao Yan , Yuchao Li , Tianli Wu , Yao Zhang

引用次数: 0

Manipulating adsorbate configurations in copper electroplated low aspect-ratio via fill in redistribution layers 通过填充再分布层操纵低纵横比电镀铜中的吸附配置

IF 17.9 2区材料科学

Nano Materials Science Pub Date : 2025-08-01 DOI: 10.1016/j.nanoms.2024.07.001

Zhenjia Peng , Zhe Li , Yu Jiao , Ning Zhang , Qi Zhang , Binbin Zhou , Liyin Gao , Xianzhu Fu , Zhiquan Liu , Rong Sun

{"title":"Manipulating adsorbate configurations in copper electroplated low aspect-ratio via fill in redistribution layers","authors":"Zhenjia Peng , Zhe Li , Yu Jiao , Ning Zhang , Qi Zhang , Binbin Zhou , Liyin Gao , Xianzhu Fu , Zhiquan Liu , Rong Sun","doi":"10.1016/j.nanoms.2024.07.001","DOIUrl":"10.1016/j.nanoms.2024.07.001","url":null,"abstract":"<div><div>Copper metal is widely electroplated for microelectronic interconnections such as redistribution layers (RDL), pillar bumps, through silicon vias, etc. With advances of multilayered RDL, via-on-via structures have been developed for ultrahigh-density any-layer interconnection, which expects superconformal filling of interlayer low aspect-ratio vias jointly with coplanar lines and pads. However, it poses a great challenge to electrodeposition, because current via fill mechanisms are stemming from middle to high aspect-ratio (>0.8) vias and lacking applicability in low aspect-ratio (<0.3) RDL-vias, where via geometry related electric-flow fields coupling must be reconsidered. In the present work, a four-additive strategy has been developed for RDL-vias fill and thoroughly investigated from additive electrochemistry, in situ Raman spectroelectrochemistry, and quantum chemistry perspectives. A novel adsorbate configuration controlled (ACC) electrodeposition mechanism is established that at weak-convection bilateral edges and lower corners, the adsorbate displays a weakly-adsorbing configuration to assist accelerator-governed deposition, whereas at strong-convection center, the adsorbate exhibits a mildly-adsorbing configuration to promote leveler-determined inhibition. Deposit profiles can be tailored from dished, flat to domed, depending on predominance of leveler over accelerator. This study should lay theoretical and practical foundations in design and application of copper electroplating additives of multiple adsorbate configurations to cope with complicated interconnect scenarios.</div></div>","PeriodicalId":33573,"journal":{"name":"Nano Materials Science","volume":"7 4","pages":"Pages 500-510"},"PeriodicalIF":17.9,"publicationDate":"2025-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141853411","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Synergistic role of plasmonic Au-doped MOF with ZnIn2S4/MoS2 nanosheets for boosted photocatalytic hydrogen evolution 等离子体au掺杂MOF与ZnIn2S4/MoS2纳米片在促进光催化析氢中的协同作用

IF 17.9 2区材料科学

Nano Materials Science Pub Date : 2025-08-01 DOI: 10.1016/j.nanoms.2024.06.001

Mirza Abdullah Rehan, Honghua Liang, Guiqiang Li

{"title":"Synergistic role of plasmonic Au-doped MOF with ZnIn2S4/MoS2 nanosheets for boosted photocatalytic hydrogen evolution","authors":"Mirza Abdullah Rehan, Honghua Liang, Guiqiang Li","doi":"10.1016/j.nanoms.2024.06.001","DOIUrl":"10.1016/j.nanoms.2024.06.001","url":null,"abstract":"<div><div>The construction of a well-defined and efficient Z-scheme heterostructure with enhanced photogenerated charge carriers and their rapid transfer is vital for realizing efficient photocatalytic hydrogen production, to achieve carbon neutrality. Herein, we study the H2 evolution reaction by rationally constructing a hybrid Au-anchored UiO-66-NH2 with localized surface plasmon resonance (LSPR) properties, embedded with ZnIn2S4/MoS2 nanosheets. Interestingly, the synergistic effect of excellent heterojunction, tunes additional catalytic active sites, provides effective separation of photogenerated charges at the junction interface and establishes a dedicated microenvironment for the boosted electron transfer. Notably, the optimized hybrid photocatalyst (Au6@U6N)15/ZIS/MS5 exhibits highly efficient H2 generation of 58.2 mmol g−1 h−1, which is almost 16 and 1.5 folds of the pristine ZIS and MS/U6N/ZIS, correspondingly. It has an apparent quantum efficiency of 19.6% at a wavelength of 420 nm, surpassing several reported MOF-based ZnIn2S4 photocatalytic H2 evolution activities. Significantly, this research provides insights into the design of interface-engineered plasmonic MOF with layered encapsulated heterostructures that elucidate the role of plasmonic LSPR effect and efficiently regulate the charge transfer with enhanced microchannels, hence boosting the visible-light-driven photocatalytic activity for realizing efficient green energy conversion.</div></div>","PeriodicalId":33573,"journal":{"name":"Nano Materials Science","volume":"7 4","pages":"Pages 482-492"},"PeriodicalIF":17.9,"publicationDate":"2025-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144895216","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Experimental composable key distribution using discrete-modulated continuous variable quantum cryptography 基于离散调制连续变量量子密码的实验可组合密钥分配

Light-Science & Applications Pub Date : 2025-07-28 DOI: 10.1038/s41377-025-01924-9

Adnan A. E. Hajomer, Florian Kanitschar, Nitin Jain, Michael Hentschel, Runjia Zhang, Norbert Lütkenhaus, Ulrik L. Andersen, Christoph Pacher, Tobias Gehring

{"title":"Experimental composable key distribution using discrete-modulated continuous variable quantum cryptography","authors":"Adnan A. E. Hajomer, Florian Kanitschar, Nitin Jain, Michael Hentschel, Runjia Zhang, Norbert Lütkenhaus, Ulrik L. Andersen, Christoph Pacher, Tobias Gehring","doi":"10.1038/s41377-025-01924-9","DOIUrl":"https://doi.org/10.1038/s41377-025-01924-9","url":null,"abstract":"Establishing secure data communication necessitates secure key exchange over a public channel. Quantum key distribution (QKD), which leverages the principles of quantum physics, can achieve this with information-theoretic security. The discrete modulated (DM) continuous variable (CV) QKD protocol, in particular, is a suitable candidate for large-scale deployment of quantum-safe communication due to its simplicity and compatibility with standard high-speed telecommunication technology. Here, we present the first experimental demonstration of a four-state DM CVQKD system, successfully generating composable finite-size keys, secure against collective attacks over a 20 km fiber channel with 2.3 × 109 coherent quantum states, achieving a positive composable key rate of 11.04 × 10−3 bits/symbol. This accomplishment is enabled by using an advanced security proof, meticulously selecting its parameters, and the fast, stable operation of the system. Our results mark a significant step toward the large-scale deployment of practical, high-performance, cost-effective, and highly secure quantum key distribution networks using standard telecommunication components.","PeriodicalId":18069,"journal":{"name":"Light-Science & Applications","volume":"51 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2025-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144715365","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Self-normal and biorthogonal dynamical quantum phase transitions in non-Hermitian quantum walks 非厄米量子行走中的自正态和双正交动态量子相变

Light-Science & Applications Pub Date : 2025-07-26 DOI: 10.1038/s41377-025-01919-6

Haiting Zhang, Kunkun Wang, Lei Xiao, Peng Xue

引用次数: 0

Long-propagating ghost phonon polaritons enabled by selective mode excitation 选择模式激发使长传播鬼声子极化子成为可能

Light-Science & Applications Pub Date : 2025-07-26 DOI: 10.1038/s41377-025-01925-8

Manuka Suriyage, Qingyi Zhou, Hao Qin, Xueqian Sun, Zhuoyuan Lu, Stefan A. Maier, Zongfu Yu, Yuerui Lu

{"title":"Long-propagating ghost phonon polaritons enabled by selective mode excitation","authors":"Manuka Suriyage, Qingyi Zhou, Hao Qin, Xueqian Sun, Zhuoyuan Lu, Stefan A. Maier, Zongfu Yu, Yuerui Lu","doi":"10.1038/s41377-025-01925-8","DOIUrl":"https://doi.org/10.1038/s41377-025-01925-8","url":null,"abstract":"The ability to precisely control the excitation of phonon polaritons (PhPs) provides unique opportunities for various nanophotonic applications, such as on-chip optical communication, quantum information processing, and controlled thermal radiation. Recently, ghost hyperbolic phonon polaritons (g-HPs) have been discovered, which exhibit in-plane hyperbolic dispersion on the surface and oblique wavefronts in the bulk. These g-HPs exhibit long-range, ray-like propagation, which is highly desirable. However, selective excitation of polaritonic modes and flexible control over the directionality of g-HPs remains an open problem. In this work, we experimentally demonstrate that changing the shape of the launching micro/nano antenna allows for control over the polariton mode excitation. Using a single asymmetric triangular gold antenna fabricated on a calcite crystal surface, we showcase highly directional g-HP excitation through selectively exciting desirable polariton modes. Our near-field imaging experiments verify that the g-HP excited by the triangular antenna can propagate over 80 microns, which is consistent with our numerical predictions. Overall, by combining g-HP theory with structural engineering, our work has further developed the potential of such anisotropic materials, enabling unexpected control over g-HPs, thus opening opportunities for various applications in mid-IR optoelectronics.","PeriodicalId":18069,"journal":{"name":"Light-Science & Applications","volume":"17 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2025-07-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144710574","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

High-power, high-wall-plug-efficiency quantum cascade lasers with high-brightness in continuous wave operation at 3–300μm 3-300μm连续波工作高功率、高壁塞效率、高亮度量子级联激光器

Light-Science & Applications Pub Date : 2025-07-25 DOI: 10.1038/s41377-025-01935-6

Manijeh Razeghi, Yanbo Bai, Feihu Wang

引用次数: 0

Rigid crosslinker-assisted nondestructive direct photolithograph for patterned QLED displays 用于图案QLED显示器的刚性交联辅助无损直接光刻技术

Light-Science & Applications Pub Date : 2025-07-24 DOI: 10.1038/s41377-025-01918-7

Zhong Chen, Zhongwei Man, Shichao Rao, Jinxing Zhao, Shuaibing Wang, Runtong Zhang, Feng Teng, Aiwei Tang

{"title":"Rigid crosslinker-assisted nondestructive direct photolithograph for patterned QLED displays","authors":"Zhong Chen, Zhongwei Man, Shichao Rao, Jinxing Zhao, Shuaibing Wang, Runtong Zhang, Feng Teng, Aiwei Tang","doi":"10.1038/s41377-025-01918-7","DOIUrl":"https://doi.org/10.1038/s41377-025-01918-7","url":null,"abstract":"Recently, colloidal quantum dots (QDs) with high luminescent efficiency and tunable colors have become ideal materials for next-generation display devices. Direct photolithography is a powerful tool for patterning QD devices, but it faces the serious issue of degradation in the photophysical properties of the patterned QDs. Here, we use relatively rigid cyclopentane as a bridging group to design the crosslinker CPTA, achieving high-resolution direct photolithography of QDs with nearly nondestructive under ambient conditions. The key to the crosslinker design is the introduction of a rigid bridging group that elevates the LUMO level, providing a stronger energy barrier to prevent QD electrons from being trapped or undergoing non-radiative recombination, thus preserving their PL and EL properties. The efficient and high-resolution RGB line and dot arrays were fabricated with pixel sizes down to 1 μm and a resolution of up to 6350 PPI. The patterned RGB QD films, especially red QDs, maintained their optical and optoelectronic properties, with patterned red QLEDs achieving peak external quantum efficiency (EQE) of 21% and a maximum luminance (Lmax) of ~180,000 cd m⁻², matching pristine devices. These results highlight the importance of photo-crosslinker design for nondestructive QDs patterning, paving the way for advanced display applications in patterned QLED technology.","PeriodicalId":18069,"journal":{"name":"Light-Science & Applications","volume":"18 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2025-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144693812","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches. 逆光刻技术的进展与挑战：基于人工智能的方法综述。

Light-Science & Applications Pub Date : 2025-07-24 DOI: 10.1038/s41377-025-01923-w

Yixin Yang,Kexuan Liu,Yunhui Gao,Chen Wang,Liangcai Cao

{"title":"Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches.","authors":"Yixin Yang,Kexuan Liu,Yunhui Gao,Chen Wang,Liangcai Cao","doi":"10.1038/s41377-025-01923-w","DOIUrl":"https://doi.org/10.1038/s41377-025-01923-w","url":null,"abstract":"Inverse lithography technology (ILT) is a promising approach in computational lithography to address the challenges posed by shrinking semiconductor device dimensions. The ILT leverages optimization algorithms to generate mask patterns, outperforming traditional optical proximity correction methods. This review provides an overview of ILT's principles, evolution, and applications, with an emphasis on integration with artificial intelligence (AI) techniques. The review tracks recent advancements of ILT in model improvement and algorithmic efficiency. Challenges such as extended computational runtimes and mask-writing complexities are summarized, with potential solutions discussed. Despite these challenges, AI-driven methods, such as convolutional neural networks, deep neural networks, generative adversarial networks, and model-driven deep learning methods, are transforming ILT. AI-based approaches offer promising pathways to overcome existing limitations and support the adoption in high-volume manufacturing. Future research directions are explored to exploit ILT's potential and drive progress in the semiconductor industry.","PeriodicalId":18069,"journal":{"name":"Light-Science & Applications","volume":"90 1","pages":"250"},"PeriodicalIF":0.0,"publicationDate":"2025-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144693276","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Micrometer-scale indirect photopatterning of RGB OLED emissive layers in single phase network structure 单相网状结构中RGB OLED发射层的微米尺度间接光模式

Light-Science & Applications Pub Date : 2025-07-22 DOI: 10.1038/s41377-025-01907-w

Seunghan Lee, Hyobin Ham, Shahid Ameen, Byung Hak Jhun, SeungHwan Roh, Hyeono Yee, Chang Hyeok Lim, Yuchan Heo, Hyukmin Kweon, Dongheon Han, Do Hwan Kim, Youngmin You, BongSoo Kim, Moon Sung Kang

{"title":"Micrometer-scale indirect photopatterning of RGB OLED emissive layers in single phase network structure","authors":"Seunghan Lee, Hyobin Ham, Shahid Ameen, Byung Hak Jhun, SeungHwan Roh, Hyeono Yee, Chang Hyeok Lim, Yuchan Heo, Hyukmin Kweon, Dongheon Han, Do Hwan Kim, Youngmin You, BongSoo Kim, Moon Sung Kang","doi":"10.1038/s41377-025-01907-w","DOIUrl":"https://doi.org/10.1038/s41377-025-01907-w","url":null,"abstract":"Organic light-emitting diodes (OLEDs) used in virtual and augmented reality displays require micrometer-scale red-green-blue (RGB) pixel patterns in the emissive layer (EML). However, conventional patterning methods based on evaporation and shadow masks can only produce patterns larger than tens of micrometers owing to the geometric constraint of the mask. Herein, an indirect method for photopatterning solution-processed OLED EMLs is proposed, which can be used to form micrometer-scale RGB pixel patterns without involving direct exposure to UV radiation or harsh etching processes on EMLs. EMLs can be patterned by i) forming a sacrificial photoresist (PR) pattern, ii) spin-coating an EML film, iii) converting the EML film into a single-phase network (SPN) structure by crosslinking vinylbenzyl-group-appended hosts and dopants at a low temperature, and iv) stripping the pre-formed PR pattern. Furthermore, repeating the process thrice results in the formation of RGB EML patterns. During the repeated process, the sacrificial PR pattern serves as a protective layer for the underlying EML pattern, effectively preventing the EML pattern from being exposed to solutions in subsequent processes. Using a conventional photolithography setup, we produced sets of RGB EML patterns with densities exceeding 3000 patterns/in., which indicated the potential of the method for industrial use.","PeriodicalId":18069,"journal":{"name":"Light-Science & Applications","volume":"25 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2025-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144677388","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

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