{"title":"Charmed hadron production from secondary (overline{p} + p) annihilations in p+A reactions at FAIR","authors":"Tom Reichert, Jan Steinheimer, Marcus Bleicher","doi":"10.1140/epja/s10050-025-01583-9","DOIUrl":"10.1140/epja/s10050-025-01583-9","url":null,"abstract":"<div><p>We present estimates for the production cross sections of charmed states (<span>(Lambda _c, Sigma _c, Xi _c, D, textrm{and}, D_s)</span>) from secondary <span>(overline{B} + B)</span> annihilations in p+A reactions from <span>(E_textrm{lab}=10-30A)</span> GeV. We focus specifically on the newly planned hadron physics program of CBM at FAIR. These estimates for the production of charmed states are based on the achievable number of <span>(overline{B} + B)</span> annihilations and their invariant mass distributions calculated in the UrQMD transport model.</p></div>","PeriodicalId":786,"journal":{"name":"The European Physical Journal A","volume":"61 5","pages":""},"PeriodicalIF":2.6,"publicationDate":"2025-05-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1140/epja/s10050-025-01583-9.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144084889","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Interfacial properties of monolayer PtSe2 FETs: A comparative study of traditional metal and semimetal electrodes","authors":"Songyang Li, Xu Li, Jingjun Chen, Zelong Ma, Danni Wang, Peisong Lu, Wenjie Chen, Baoan Bian, Xiao Ouyang, Bin Liao","doi":"10.1007/s00339-025-08590-z","DOIUrl":"10.1007/s00339-025-08590-z","url":null,"abstract":"<div><p>In this work, the interfacial properties of field-effect transistors (FETs) based on monolayer PtSe<sub>2</sub> are systematically investigated using first principles. Six traditional metals (Sc, In, Ti, Au, Pd, Pt) along with three semimetals (As, Sb, Bi) are chosen as electrodes. At the vertical interface, when traditional metals (Sc, In, Ti, Au, Pd, Pt) are used as electrodes, the PtSe<sub>2</sub> is metallized. However, when semimetals (As, Sb, Bi) are used as electrodes, the band gap of PtSe<sub>2</sub> is preserved, forming the quasi-ohmic contact. At the lateral interface, traditional metals and semimetals form Schottky contacts with Fermi level pinning factors of 0.24 and 0.79 for the hole Schottky barriers, respectively. Compared to traditional metals, the semimetals demonstrate significant advantages in constructing p-type Schottky contacts and suppressing Fermi level pinning. This study offers theoretical support for the development of high-performance devices based on PtSe<sub>2</sub>.</p></div>","PeriodicalId":473,"journal":{"name":"Applied Physics A","volume":"131 6","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-05-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144073820","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
L. Russo, R. Bedogni, M. A. Caballero-Pacheco, A. I. Castro-Campoy, F. L. Frigi, A. Pietropaolo, A. Calamida, J. M. Gomez-Ros, S. Turchi, A. Allaoua, Q. Ducasse, N. Magalotti, F. Pozzi
{"title":"A new neutron area monitor with extended energy range","authors":"L. Russo, R. Bedogni, M. A. Caballero-Pacheco, A. I. Castro-Campoy, F. L. Frigi, A. Pietropaolo, A. Calamida, J. M. Gomez-Ros, S. Turchi, A. Allaoua, Q. Ducasse, N. Magalotti, F. Pozzi","doi":"10.1140/epjp/s13360-025-06348-3","DOIUrl":"10.1140/epjp/s13360-025-06348-3","url":null,"abstract":"<div><p>Radiation protection monitoring in installations producing high-energy neutrons requires dedicated instrumentation, called extended range neutron area monitors (ERNAM). With the main purpose of increasing the sensitivity of this class of instrument, while keeping a good degree of isotropy, a new portable device called neutron extended counter for high energy (NECH) was prototyped. NECH is based on a Helium-3 proportional counter placed in the center of a cylindrical polyethylene moderator with truncated cone ends, embedding a lead insert to promote the detection of neutrons above 20 MeV. NECH responds nearly isotropically, in terms of ambient dose equivalent H*(10), up to GeV neutrons. Its sensitivity is about three times larger than common commercial instruments of the same class. This novel instrument was fully simulated with Monte Carlo N-Particle (MCNP) and calibrated in radionuclide-based reference neutron fields at IRSN Cadarache and ENEA Frascati. Workplace testing was performed around the ENEA Frascati Neutron Generator operating at 2.5 MeV and, for the high-energy domain, at the CERN-EU high-energy Reference Field facility (CERF). This work presents the instrument, the simulated and measured dose equivalent response and the results of the workplace testing. The performance is compared with that of commercial ERNAMs.</p></div>","PeriodicalId":792,"journal":{"name":"The European Physical Journal Plus","volume":"140 5","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-05-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144084861","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Saá-Hernández, D. González-Díaz, J. Martín-Albo, M. Tuzi, P. Amedo, J. Baldonedo, C. Benítez, S. Bounasser, E. Casarejos, J. Collazo, A. Fernández-Prieto, D. J. Fernández-Posada, R. Hafeji, S. Leardini, D. Rodas-Rodríguez, A. L. Saborido, A. Segade, A. Slater
{"title":"On the determination of the interaction time of GeV neutrinos in large argon gas TPCs","authors":"A. Saá-Hernández, D. González-Díaz, J. Martín-Albo, M. Tuzi, P. Amedo, J. Baldonedo, C. Benítez, S. Bounasser, E. Casarejos, J. Collazo, A. Fernández-Prieto, D. J. Fernández-Posada, R. Hafeji, S. Leardini, D. Rodas-Rodríguez, A. L. Saborido, A. Segade, A. Slater","doi":"10.1140/epjc/s10052-025-14248-0","DOIUrl":"10.1140/epjc/s10052-025-14248-0","url":null,"abstract":"<div><p>Next-generation megawatt-scale neutrino beams open the way to studying neutrino-nucleus scattering using gaseous targets for the first time. This represents an opportunity to improve the knowledge of neutrino cross sections in the energy region between hundreds of MeV and a few GeV, of interest for the upcoming generation of long-baseline neutrino oscillation experiments. The challenge is to accurately track and (especially) time the particles produced in neutrino interactions in large and seamless volumes down to few-MeV energies. We propose to accomplish this through an optically-read time projection chamber (TPC) filled with high-pressure argon and equipped with both tracking and timing functions. In this work, we present a detailed study of the time-tagging capabilities of such a device, based on end-to-end optical simulations that include the effect of photon propagation, photosensor response, dark count rate and pulse reconstruction. We show that the neutrino interaction time can be reconstructed from the primary scintillation signal with a precision in the range of 1–2.5 ns <span>((sigma ))</span> for point-like deposits with energies down to 5 MeV. A similar response is observed for minimum-ionizing particle tracks extending over lengths of a few meters. A discussion on previous limitations towards such a detection technology, and how they can be realistically overcome in the near future thanks to recent developments in the field, is presented. The performance demonstrated in our analysis seems to be well within reach of next-generation neutrino-oscillation experiments, through the instrumentation of the proposed TPC with conventional reflective materials and a silicon photomultiplier array behind a transparent cathode.\u0000\u0000</p></div>","PeriodicalId":788,"journal":{"name":"The European Physical Journal C","volume":"85 5","pages":""},"PeriodicalIF":4.2,"publicationDate":"2025-05-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1140/epjc/s10052-025-14248-0.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144084886","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"An algebraic approach to gravitational quantum mechanics","authors":"Won Sang Chung, Georg Junker, Hassan Hassanabadi","doi":"10.1140/epjp/s13360-025-06335-8","DOIUrl":"10.1140/epjp/s13360-025-06335-8","url":null,"abstract":"<div><p>Most approaches towards a quantum theory of gravitation indicate the existence of a minimal length scale of the order of the Planck length. Quantum mechanical models incorporating such an intrinsic length scale call for a deformation of Heisenberg’s algebra resulting in a generalised uncertainty principle and constitute what is called gravitational quantum mechanics. Utilising the position representation of this deformed algebra, we study various models of gravitational quantum mechanics. The free time evolution of a Gaussian wave packet is investigated as well as the spectral properties of a particle bound by an external attractive potential. Here the cases of a box with infinite walls and an attractive potential well of finite depth are considered.</p></div>","PeriodicalId":792,"journal":{"name":"The European Physical Journal Plus","volume":"140 5","pages":""},"PeriodicalIF":2.8,"publicationDate":"2025-05-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1140/epjp/s13360-025-06335-8.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144073733","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Applied Physics APub Date : 2025-05-17DOI: 10.1007/s00339-025-08593-w
Yang Chen, Chuyao Ni, Zihao Zhou, Jianwu Xiao, Jun Cao, Jiaqi Pan, Chaorong Li, Yingying Zheng
{"title":"Heparinization of triple-layer electrospun PLA-COL@PLA-PCL@PCL-GEL small-caliber vascular scaffold with higher anticoagulant performance","authors":"Yang Chen, Chuyao Ni, Zihao Zhou, Jianwu Xiao, Jun Cao, Jiaqi Pan, Chaorong Li, Yingying Zheng","doi":"10.1007/s00339-025-08593-w","DOIUrl":"10.1007/s00339-025-08593-w","url":null,"abstract":"<div><p>Triple-layer small-caliber vascular scaffolds were prepared using multi-step electrospinning technology, with polylactic acid (PLA) and collagen (COL) used for the inner layer, PLA and polycaprolactone (PCL) for the middle layer and polycaprolactone (PCL) and gelatine (GEL) for the outermost layer. The triple-layer vascular scaffolds were then deposited by chitosan and followed by chemical crosslinking of heparin to improve the anti-coagulant properties of vascular scaffolds. The deposited chitosan provided more amino active sites for the cross-linking of heparin. The heparinization of vascular scaffolds provided excellent hydrophilic properties, and promoted cell adhesion and proliferation on inner layer of vascular scaffolds. On day 5 of cell proliferation, the vascular scaffolds (PC21-CHep) with PLA: COL = 2:1, loaded-chitosan and grafted-heparin was almost completely covered with endothelial cells, which made the endothelialization possible. The maximum tensile stress in the axial direction of the PC21-CHep scaffold reached 8.47 MPa, which far exceeded the tensile strength of natural vessels. In terms of anticoagulation, the vascular scaffolds with more grafted-heparin showed a much higher anticoagulant performance than vascular scaffolds without functionalized modification of heparin. The prepared vascular scaffold is a promising potential alternative in vascular tissue engineering with excellent anticoagulant effect.</p></div>","PeriodicalId":473,"journal":{"name":"Applied Physics A","volume":"131 6","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144073941","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Applied Physics APub Date : 2025-05-17DOI: 10.1007/s00339-025-08540-9
Lukas P. Lingenfelder, Annemarie Finzel, Gregor Dornberg, Joachim Zajadacz, Frank Frost
{"title":"Enhanced planarization technology by reactive ion beam etching and using a nanoimprint resist","authors":"Lukas P. Lingenfelder, Annemarie Finzel, Gregor Dornberg, Joachim Zajadacz, Frank Frost","doi":"10.1007/s00339-025-08540-9","DOIUrl":"10.1007/s00339-025-08540-9","url":null,"abstract":"<div><p>In the pursuit of high-end optics, the fabrication of ultra-smooth surfaces is essential to minimize quality degradation and light scattering and to improve optical performance. One example of this are mirrors that are produced using single-point diamond turning (SPDT), a process that introduces surface roughness necessitating subsequent post-processing. This study investigates the use of ion beam planarization (IBP) with a low-viscosity nanoimprint photoresist applied via spin coating as a novel method for turning mark removal. The study evaluates the effectiveness of this nanoimprint resist in reducing surface roughness across various spatial frequencies on specially prepared silicon substrates with line patterns up to a spatial wavelength of 30 <span>(upmu )</span>m. The degree of planarization (DoP) achieved with the nanoimprint resist was compared to that of a conventional photoresist. Additionally, the etch transfer of the smooth resist surface to the silicon substrate was demonstrated using reactive ion beam etching (RIBE) under normal ion incidence. Through a gradient etching process, the selectivity - the removal rate ratio of resist to substrate - was varied around a value of 1, assessing the process stability. The results demonstrated that the nanoimprint resist exhibits superior leveling properties compared to established photoresists, consistently achieving a DoP of 6% irrespective of spatial wavelengths. In contrast, the standard photoresist showed a significant loss of DoP at spatial wavelengths exceeding 9 <span>(upmu )</span>m. Furthermore, successful pattern transfer of the smooth resist morphology into the substrate was accomplished, with a RMS-roughness reduction achieved from 13 nm to 0.5 nm. Variations in selectivity around the optimal value of 1 generally exhibited the predicted behavior, though a slight shift of the optimum from theoretical predictions towards lower values was observed and discussed.</p></div>","PeriodicalId":473,"journal":{"name":"Applied Physics A","volume":"131 6","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s00339-025-08540-9.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144074097","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Applied Physics APub Date : 2025-05-17DOI: 10.1007/s00339-025-08528-5
Ishu Singhal, Ayushi Mishra, B. S. Balaji
{"title":"Molecular dynamics simulation study of heavy metal ions accumulation between graphene nano-channel under external electric field","authors":"Ishu Singhal, Ayushi Mishra, B. S. Balaji","doi":"10.1007/s00339-025-08528-5","DOIUrl":"10.1007/s00339-025-08528-5","url":null,"abstract":"<div><p>Heavy metal ion remediation from water system through accumulation using external electric field is proposed. Here, graphene nano-channel is utilized for heavy metal accumulation under different magnitude of electric fields (1.0 V/Å, 1.5 V/Å, and 2.0 V/Å). Molecular dynamics simulation was carried out in three phases i.e. initiation, accumulation, and cleaning phase. Cadmium, mercury, and lead heavy metal ions were selected and relative position, distance, energy, and radial distribution function were evaluated. The results show that the electrostatic attraction between the positively charged heavy metal ions and the negatively charged graphene nano-channel significantly increases with the increase in the magnitude of the external electric field, consequently enhancing ion accumulation. The interaction of the ions with the graphene nano-channel at the external electric field of 1.5 V/Å was found to be suitable.</p></div>","PeriodicalId":473,"journal":{"name":"Applied Physics A","volume":"131 6","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144074015","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Applied Physics APub Date : 2025-05-17DOI: 10.1007/s00339-025-08597-6
Chenyu Wang, Kai Cui, Yuan Li, Haonan Cui, Hongli Lin, Yuting Wang, Jianwei Shi
{"title":"Optimized design of self-releasing microarray mold based on shape memory polymer","authors":"Chenyu Wang, Kai Cui, Yuan Li, Haonan Cui, Hongli Lin, Yuting Wang, Jianwei Shi","doi":"10.1007/s00339-025-08597-6","DOIUrl":"10.1007/s00339-025-08597-6","url":null,"abstract":"<div><p>To reduce demolding defects in the micro molding process, a new self-release molding approach is proposed for products with microarray structures. Specifically, shape memory polymer (SMP) is filled in the mold cavities and its shape memory effect is used to overcome the demolding resistance, enabling automatic demolding of the micro products. To study the feasibility of this process and improve the self-releasing molding effect, numerical simulation is carried out using ABAQUS. The analysis considers the internal stress in the products due to SMP’s unbalanced response, and the response status of the SMP fillers. These factors are used as indexes for a control variable study on the parameters of the self-release molding process. The results show that reducing the number of microarray structures, increasing the distance between pattern distributions, and constructing an array pattern with parallel edges can decrease defects in the finished products caused by the unbalanced recovery of the SMP. Additionally, reducing the diameter or height of the SMP filler, selecting the appropriate heating temperature, and extending the heating time facilitate the self-releasing. Finally, a comprehensive design method for self-releasing molds for microarray structures is gradually founded to provide guidance for future applications.</p></div>","PeriodicalId":473,"journal":{"name":"Applied Physics A","volume":"131 6","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144074108","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Applied Physics APub Date : 2025-05-17DOI: 10.1007/s00339-025-08579-8
K. M. S. Dawngliana, S. Rai
{"title":"Spectroscopic properties and Judd–Ofelt study of Ho3+ doped alumino-silicate glasses for green laser applications","authors":"K. M. S. Dawngliana, S. Rai","doi":"10.1007/s00339-025-08579-8","DOIUrl":"10.1007/s00339-025-08579-8","url":null,"abstract":"<div><p>A novel Ho<sup>3+</sup> ion doped alumino-silicate (SiAl) glasses with chemical composition (70-x)SiO<sub>2</sub> + 30Al<sub>2</sub>O<sub>3</sub> + xHo<sub>2</sub>O<sub>3</sub> (x ranged from 0.5, 0.8, 1.2 and 1.6 mol%, and was referred to as Ho<sup>3+</sup> ions concentration) was prepared with sol–gel method. An increase in Ho<sup>3</sup>⁺ ion concentration leads to a corresponding rise in both the density and refractive index of the glass. X-ray diffraction and scanning electron microscopy analyses confirmed the amorphous nature of the prepared SiAlHo glass. Fourier transform infrared spectroscopy was used to identify the functional groups present in the glass system. The Judd–Ofelt parameters Ω<sub>λ</sub> (λ = 2, 4, 6) were evaluated from the measured intensities of various absorption bands in these glasses and compared with those reported for other glass systems. Radiative properties—including radiative transition probabilities (A<sub>ed</sub>), effective bandwidth (Δλ<sub>eff</sub>), branching ratios (β<sub>R</sub>), radiative lifetime (τ<sub>R</sub>), total radiative transition probability (A<sub>T</sub>), and stimulated emission cross-section (σ<sub>P</sub>) were also analyzed for different excited states of Ho<sup>3</sup>⁺ ions. A prominent green photoluminescence emission corresponding to the <sup>5</sup>S<sub>2</sub> + <sup>5</sup>F<sub>4</sub> → <sup>5</sup>I<sub>8</sub> transition was observed at 547 nm. The photoluminescence spectra revealed the quenching of luminescence intensity beyond 1.2 mol% of Ho<sup>3+</sup> ion concentration in alumino-silicate glasses. The greenish-yellow region was displayed in the estimated CIE color coordinates for different concentrations of Ho<sup>3+</sup> ions doped alumino-silicate glasses. Therefore, the SiAl glass matrix doped with 1.2 mol% Ho<sup>3</sup>⁺ emerges as a promising candidate for green light-emitting applications.</p></div>","PeriodicalId":473,"journal":{"name":"Applied Physics A","volume":"131 6","pages":""},"PeriodicalIF":2.5,"publicationDate":"2025-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144074095","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}