合金元素对Si(001)衬底上超薄Ni (<10nm)相形成的影响

2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM) Pub Date : 2015-05-18 DOI:10.1109/IITC-MAM.2015.7325615

F. Geenen, K. van Stiphout, J. Jordan-Sweef, A. Vantomme, C. Lavoie, C. Detavernier

{"title":"合金元素对Si(001)衬底上超薄Ni (<10nm)相形成的影响","authors":"F. Geenen, K. van Stiphout, J. Jordan-Sweef, A. Vantomme, C. Lavoie, C. Detavernier","doi":"10.1109/IITC-MAM.2015.7325615","DOIUrl":null,"url":null,"abstract":"The influence of Ni thickness on the formation of Nickel suicides was systematically investigated between 0 and 15nm. Annealing thickness gradients distinguishes Alms that agglomerate (>5nm) and films that are morphologically stable (<;5nm). Alloying the initial Ni layer influences this critical thickness to higher (Al, Co) and lower (Ge, Pd, Pt) values. Pole figures and in situ XRD provides information to understand this observed shift in critical thickness.","PeriodicalId":6514,"journal":{"name":"2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM)","volume":"21 1","pages":"183-186"},"PeriodicalIF":0.0000,"publicationDate":"2015-05-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Influence of alloying elements on the phase formation of ultrathin Ni (<10nm) on Si(001) substrates\",\"authors\":\"F. Geenen, K. van Stiphout, J. Jordan-Sweef, A. Vantomme, C. Lavoie, C. Detavernier\",\"doi\":\"10.1109/IITC-MAM.2015.7325615\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The influence of Ni thickness on the formation of Nickel suicides was systematically investigated between 0 and 15nm. Annealing thickness gradients distinguishes Alms that agglomerate (>5nm) and films that are morphologically stable (<;5nm). Alloying the initial Ni layer influences this critical thickness to higher (Al, Co) and lower (Ge, Pd, Pt) values. Pole figures and in situ XRD provides information to understand this observed shift in critical thickness.\",\"PeriodicalId\":6514,\"journal\":{\"name\":\"2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM)\",\"volume\":\"21 1\",\"pages\":\"183-186\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-05-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IITC-MAM.2015.7325615\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC-MAM.2015.7325615","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

在0 ~ 15nm范围内系统地研究了Ni厚度对镍自杀体形成的影响。退火厚度梯度可以区分成团的(>5nm)和形态稳定的(< 5nm)薄膜。将初始Ni层合金化会影响临界厚度，使其升高(Al, Co)，降低(Ge, Pd, Pt)。极点图和原位XRD提供了理解这种观察到的临界厚度变化的信息。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Influence of alloying elements on the phase formation of ultrathin Ni (<10nm) on Si(001) substrates

The influence of Ni thickness on the formation of Nickel suicides was systematically investigated between 0 and 15nm. Annealing thickness gradients distinguishes Alms that agglomerate (>5nm) and films that are morphologically stable (<;5nm). Alloying the initial Ni layer influences this critical thickness to higher (Al, Co) and lower (Ge, Pd, Pt) values. Pole figures and in situ XRD provides information to understand this observed shift in critical thickness.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM)

自引率

0.00%

发文量