无铅焊流下掺c相变存储器中Ti的影响

L. Perniola, P. Noé, Q. Hubert, S. Souiki, G. Ghezzi, G. Navarro, A. Cabrini, A. Persico, V. Delaye, D. Blachier, J. Barnes, E. Henaff, M. Tessaire, E. Souchier, A. Roule, F. Fillot, J. Ferrand, A. Fargeix, F. Hippert, J. Raty, C. Jahan, V. Sousa, G. Torelli, S. Maitrejean, B. De Salvo, G. Reimbold
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引用次数: 9

摘要

在本文中,我们对工程PCM堆栈进行了彻底的物理化学分析,其中c掺杂和Ti顶层的集成允许获得非晶as沉积(a - ad)相稳定的后端线(BEOL)热收支。然后将该PCM堆栈集成到器件中,对器件进行广泛测试,以验证符合无铅焊接回流问题的新型预编码技术。最后,提出了一种优化分布色散的原始设计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ti impact in C-doped phase-change memories compliant to Pb-free soldering reflow
In this paper, we present a thorough physical-chemical analysis of an engineered PCM stack, where the integration of C-doping and the use of a Ti top layer allow obtaining an Amorphous As-Deposited (A-AD) phase stable against Back End-Of-Line (BEOL) thermal budget. This PCM stack is then integrated in devices, which are extensively tested in order to validate a novel pre-coding technique compliant to the Pb-free soldering reflow issue. Finally, an original design to optimize the distribution dispersion is presented.
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