无晶圆损坏的Epi电阻率曲线

K. Woolford, C. Panczyk, G. Martel
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引用次数: 1

摘要

非接触的方法现在可以用来测量硅外延的电阻率。这项新技术为晶圆制造商提供了显著降低运营成本的机会,并通过消除对监控晶圆的需求来提高反应堆容量。我们的小组研究了Epimet Model 2 (SemiTest, Inc.)用于监测epi晶圆生产。我们的评估显示了合适的测量重复性、再现性和稳定性。此外,Epimet在头对头测量能力比较中显著优于hg探针CV。本文重点介绍了所进行的产品-晶圆完整性测试,这些测试表明Epimet确实对晶圆无污染且不损坏,因此可以用于监控实际产品晶圆。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Epi resistivity profiles without wafer damage
Non-contact methods are now available to measure the resistivity of silicon epitaxy. The new technology offers wafer manufacturers the opportunity to significantly lower operating costs and increase reactor capacity by eliminating the need for monitor wafers. Our group investigated the Epimet Model 2 (SemiTest, Inc.) for monitoring epi wafer production. Our evaluation shows suitable measurement repeatability, reproducibility, and stability for the epi parts tested. Further, the Epimet significantly outperforms the Hg-probe CV in head-to-head measurement capability comparison. This paper focuses on the product-wafer integrity tests performed which demonstrated that the Epimet is indeed non-contaminating and non-damaging to wafers, allowing it to be used to monitor actual product wafers.
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