铝合金电极的化学镀镍/浸金工艺

S. Kawashima
{"title":"铝合金电极的化学镀镍/浸金工艺","authors":"S. Kawashima","doi":"10.1109/IMPACT.2011.6117175","DOIUrl":null,"url":null,"abstract":"Electronic equipment has changed to have higher performance with minimized in size. This trend required to electronic devices minimization also. Numerous packaging techniques have developed using metal flame, PWB material and plastic tape to mount semiconductor devices on PWB1). To achieve further high mounting density, the semiconductor device directly solder mounted on package after forming metal bumps on electrode of semiconductor devices. Aluminum alloy is common material for electrode of semiconductor devices, since it has relatively high conductivity, chemically stable and less reaction in semiconductor manufacturing process. However, it needs other meal layer for soldering to form bump on it. Sputtered Ti/Cu layer and electrolytic solder plating is widely used to form solder bump. However, this process requires longer and costly process such as multiple vacuum process, photo image process, etc.","PeriodicalId":6360,"journal":{"name":"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)","volume":"36 1","pages":"381-384"},"PeriodicalIF":0.0000,"publicationDate":"2011-12-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Electroless nickel/Immersion gold process on Aluminum alloy electrodes\",\"authors\":\"S. Kawashima\",\"doi\":\"10.1109/IMPACT.2011.6117175\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Electronic equipment has changed to have higher performance with minimized in size. This trend required to electronic devices minimization also. Numerous packaging techniques have developed using metal flame, PWB material and plastic tape to mount semiconductor devices on PWB1). To achieve further high mounting density, the semiconductor device directly solder mounted on package after forming metal bumps on electrode of semiconductor devices. Aluminum alloy is common material for electrode of semiconductor devices, since it has relatively high conductivity, chemically stable and less reaction in semiconductor manufacturing process. However, it needs other meal layer for soldering to form bump on it. Sputtered Ti/Cu layer and electrolytic solder plating is widely used to form solder bump. However, this process requires longer and costly process such as multiple vacuum process, photo image process, etc.\",\"PeriodicalId\":6360,\"journal\":{\"name\":\"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)\",\"volume\":\"36 1\",\"pages\":\"381-384\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-12-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMPACT.2011.6117175\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMPACT.2011.6117175","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

电子设备已经改变为具有更高的性能和最小的尺寸。这种趋势也要求电子设备最小化。使用金属火焰、PWB材料和塑料胶带在PWB1上安装半导体器件的封装技术已经发展了许多。为了实现更高的安装密度,半导体器件在半导体器件的电极上形成金属凸起后直接焊接安装在封装上。铝合金具有导电性高、化学性质稳定、在半导体制造过程中反应少等优点,是半导体器件常用的电极材料。然而,它需要另一个粉层焊接,以形成凹凸。溅射Ti/Cu层和电解镀锡被广泛用于形成凸点。然而,这种工艺需要更长的时间和昂贵的工艺,如多次真空工艺,照片图像工艺等。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electroless nickel/Immersion gold process on Aluminum alloy electrodes
Electronic equipment has changed to have higher performance with minimized in size. This trend required to electronic devices minimization also. Numerous packaging techniques have developed using metal flame, PWB material and plastic tape to mount semiconductor devices on PWB1). To achieve further high mounting density, the semiconductor device directly solder mounted on package after forming metal bumps on electrode of semiconductor devices. Aluminum alloy is common material for electrode of semiconductor devices, since it has relatively high conductivity, chemically stable and less reaction in semiconductor manufacturing process. However, it needs other meal layer for soldering to form bump on it. Sputtered Ti/Cu layer and electrolytic solder plating is widely used to form solder bump. However, this process requires longer and costly process such as multiple vacuum process, photo image process, etc.
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