{"title":"铝合金电极的化学镀镍/浸金工艺","authors":"S. Kawashima","doi":"10.1109/IMPACT.2011.6117175","DOIUrl":null,"url":null,"abstract":"Electronic equipment has changed to have higher performance with minimized in size. This trend required to electronic devices minimization also. Numerous packaging techniques have developed using metal flame, PWB material and plastic tape to mount semiconductor devices on PWB1). To achieve further high mounting density, the semiconductor device directly solder mounted on package after forming metal bumps on electrode of semiconductor devices. Aluminum alloy is common material for electrode of semiconductor devices, since it has relatively high conductivity, chemically stable and less reaction in semiconductor manufacturing process. However, it needs other meal layer for soldering to form bump on it. Sputtered Ti/Cu layer and electrolytic solder plating is widely used to form solder bump. However, this process requires longer and costly process such as multiple vacuum process, photo image process, etc.","PeriodicalId":6360,"journal":{"name":"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)","volume":"36 1","pages":"381-384"},"PeriodicalIF":0.0000,"publicationDate":"2011-12-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Electroless nickel/Immersion gold process on Aluminum alloy electrodes\",\"authors\":\"S. Kawashima\",\"doi\":\"10.1109/IMPACT.2011.6117175\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Electronic equipment has changed to have higher performance with minimized in size. This trend required to electronic devices minimization also. Numerous packaging techniques have developed using metal flame, PWB material and plastic tape to mount semiconductor devices on PWB1). To achieve further high mounting density, the semiconductor device directly solder mounted on package after forming metal bumps on electrode of semiconductor devices. Aluminum alloy is common material for electrode of semiconductor devices, since it has relatively high conductivity, chemically stable and less reaction in semiconductor manufacturing process. However, it needs other meal layer for soldering to form bump on it. Sputtered Ti/Cu layer and electrolytic solder plating is widely used to form solder bump. However, this process requires longer and costly process such as multiple vacuum process, photo image process, etc.\",\"PeriodicalId\":6360,\"journal\":{\"name\":\"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)\",\"volume\":\"36 1\",\"pages\":\"381-384\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-12-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMPACT.2011.6117175\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMPACT.2011.6117175","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Electroless nickel/Immersion gold process on Aluminum alloy electrodes
Electronic equipment has changed to have higher performance with minimized in size. This trend required to electronic devices minimization also. Numerous packaging techniques have developed using metal flame, PWB material and plastic tape to mount semiconductor devices on PWB1). To achieve further high mounting density, the semiconductor device directly solder mounted on package after forming metal bumps on electrode of semiconductor devices. Aluminum alloy is common material for electrode of semiconductor devices, since it has relatively high conductivity, chemically stable and less reaction in semiconductor manufacturing process. However, it needs other meal layer for soldering to form bump on it. Sputtered Ti/Cu layer and electrolytic solder plating is widely used to form solder bump. However, this process requires longer and costly process such as multiple vacuum process, photo image process, etc.