硅、碳化硅和氮化镓在电力电子中的作用

M. Treu, E. Vecino, M. Pippan, O. Haberlen, G. Curatola, G. Deboy, M. Kutschak, U. Kirchner
{"title":"硅、碳化硅和氮化镓在电力电子中的作用","authors":"M. Treu, E. Vecino, M. Pippan, O. Haberlen, G. Curatola, G. Deboy, M. Kutschak, U. Kirchner","doi":"10.1109/IEDM.2012.6478995","DOIUrl":null,"url":null,"abstract":"Silicon carbide (SiC) and latest gallium nitride (GaN) are two semiconductor materials which entered the power device arena which has been set up and still is being dominated by silicon based devices. The following paper will make a basic comparison of power devices out of these three base materials valid for medium voltage classes of some hundred to above 1000V. This paper will start with comparisons of common electrical figures of merit (FOM) and will focus less on the exact values but on the possible trends and current limits concerning the different materials. These findings will be brought in relation to application requirements.","PeriodicalId":6376,"journal":{"name":"2012 International Electron Devices Meeting","volume":"71 1","pages":"7.1.1-7.1.4"},"PeriodicalIF":0.0000,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"26","resultStr":"{\"title\":\"The role of silicon, silicon carbide and gallium nitride in power electronics\",\"authors\":\"M. Treu, E. Vecino, M. Pippan, O. Haberlen, G. Curatola, G. Deboy, M. Kutschak, U. Kirchner\",\"doi\":\"10.1109/IEDM.2012.6478995\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Silicon carbide (SiC) and latest gallium nitride (GaN) are two semiconductor materials which entered the power device arena which has been set up and still is being dominated by silicon based devices. The following paper will make a basic comparison of power devices out of these three base materials valid for medium voltage classes of some hundred to above 1000V. This paper will start with comparisons of common electrical figures of merit (FOM) and will focus less on the exact values but on the possible trends and current limits concerning the different materials. These findings will be brought in relation to application requirements.\",\"PeriodicalId\":6376,\"journal\":{\"name\":\"2012 International Electron Devices Meeting\",\"volume\":\"71 1\",\"pages\":\"7.1.1-7.1.4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"26\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2012.6478995\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2012.6478995","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 26

摘要

碳化硅(SiC)和最新的氮化镓(GaN)是进入功率器件领域的两种半导体材料,这一领域已经建立并仍由硅基器件主导。下面的文章将对这三种基材的功率器件作一个基本的比较,这些基材适用于几百到1000V以上的中压等级。本文将从比较常见的电气性能指标(FOM)开始,并将较少关注精确值,而是关注不同材料的可能趋势和电流限制。这些调查结果将与应用需求有关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The role of silicon, silicon carbide and gallium nitride in power electronics
Silicon carbide (SiC) and latest gallium nitride (GaN) are two semiconductor materials which entered the power device arena which has been set up and still is being dominated by silicon based devices. The following paper will make a basic comparison of power devices out of these three base materials valid for medium voltage classes of some hundred to above 1000V. This paper will start with comparisons of common electrical figures of merit (FOM) and will focus less on the exact values but on the possible trends and current limits concerning the different materials. These findings will be brought in relation to application requirements.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信