物理设计表征的制造视角

D. Maynard, B. B. Reuter, J. Patrick
{"title":"物理设计表征的制造视角","authors":"D. Maynard, B. B. Reuter, J. Patrick","doi":"10.1109/ASMC.2002.1001612","DOIUrl":null,"url":null,"abstract":"Historically, physical design characterization (PDC) has been the focus of product or design engineers. This paper introduces PDC from a manufacturing perspective and the value of design-specific information for successful process control. Several PDC tools are described in terms of this integrated approach and the current embodiment at the IBM Microelectronics Vermont facility. Specifically, these tools include pattern density calculations, critical area extractions, and \"swampfinding\", a method for locating specific design-process sensitivities. The paper then develops both the technical and business strategies that leverage this information into the manufacturing processes. To clearly illustrate the concepts introduced, several examples of PDC results augmented with traditional characterization information, along with the ensuing manufacturing actions are reviewed. Finally, the larger picture of physical design characterization in manufacturing, and the impact upon development, are further developed.","PeriodicalId":64779,"journal":{"name":"半导体技术","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2002-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"A manufacturing perspective of physical design characterization\",\"authors\":\"D. Maynard, B. B. Reuter, J. Patrick\",\"doi\":\"10.1109/ASMC.2002.1001612\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Historically, physical design characterization (PDC) has been the focus of product or design engineers. This paper introduces PDC from a manufacturing perspective and the value of design-specific information for successful process control. Several PDC tools are described in terms of this integrated approach and the current embodiment at the IBM Microelectronics Vermont facility. Specifically, these tools include pattern density calculations, critical area extractions, and \\\"swampfinding\\\", a method for locating specific design-process sensitivities. The paper then develops both the technical and business strategies that leverage this information into the manufacturing processes. To clearly illustrate the concepts introduced, several examples of PDC results augmented with traditional characterization information, along with the ensuing manufacturing actions are reviewed. Finally, the larger picture of physical design characterization in manufacturing, and the impact upon development, are further developed.\",\"PeriodicalId\":64779,\"journal\":{\"name\":\"半导体技术\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-08-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"半导体技术\",\"FirstCategoryId\":\"1087\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2002.1001612\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"半导体技术","FirstCategoryId":"1087","ListUrlMain":"https://doi.org/10.1109/ASMC.2002.1001612","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

过去,物理设计表征(PDC)一直是产品或设计工程师关注的焦点。本文从制造的角度介绍了PDC,以及设计特有信息对成功的过程控制的价值。根据这种集成方法和IBM Microelectronics Vermont工厂的当前实施例,介绍了几种PDC工具。具体来说,这些工具包括模式密度计算、关键区域提取和“沼泽发现”,这是一种定位特定设计过程敏感性的方法。然后,本文将开发利用这些信息到制造过程中的技术和业务策略。为了清楚地说明所介绍的概念,本文回顾了几个使用传统特征信息增强PDC结果的示例,以及随后的制造操作。最后,进一步发展了制造业中物理设计特性的更大图景,以及对开发的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A manufacturing perspective of physical design characterization
Historically, physical design characterization (PDC) has been the focus of product or design engineers. This paper introduces PDC from a manufacturing perspective and the value of design-specific information for successful process control. Several PDC tools are described in terms of this integrated approach and the current embodiment at the IBM Microelectronics Vermont facility. Specifically, these tools include pattern density calculations, critical area extractions, and "swampfinding", a method for locating specific design-process sensitivities. The paper then develops both the technical and business strategies that leverage this information into the manufacturing processes. To clearly illustrate the concepts introduced, several examples of PDC results augmented with traditional characterization information, along with the ensuing manufacturing actions are reviewed. Finally, the larger picture of physical design characterization in manufacturing, and the impact upon development, are further developed.
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