利用二硼烷和氨在化学机械抛光(0001)4H-SiC衬底上的流动调制沉积sp2-氮化硼

IF 2.4 3区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Philip M. Jean-Remy, M. Cabral, R. Davis
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引用次数: 0

摘要

以二硼烷(B2H6)和氨(NH3)为B源和N源,采用连续流和不连续流调制化学气相沉积技术,在1030℃的(0001)4H-SiC衬底上生长了纳米晶sp2-BN薄膜。后一种技术可以观察到前驱体注射之间的氢气吹扫步骤和注射B2H6的时间长度对膜的化学计量和微观结构的影响。在N/B气相比为20 ~ 200的范围内,连续生长的膜均获得了化学计量BN;除非最小化B2H6的流速和注射时间,否则在不连续生长的薄膜中没有观察到这一点。在N/B = 200条件下连续生长和不连续生长的薄膜,以及使用较短的B2H6注射时间(相对于NH3的注射时间)进行后一种工艺路线的截面透射电镜显示,初始生长了约4 nm厚的部分有序sp2-BN层。然后形成一个包含随机取向多晶晶粒的过渡区。在长时间的B2H6注入过程中,过量的B加入到不连续生长的薄膜中,导致非晶态和sp2-BN的单层混合物,没有观察到任何有序现象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Flow-modulated deposition of sp2-boron nitride using diborane and ammonia on chemomechanically polished (0001) 4H-SiC substrates
Nanocrystalline sp2-BN thin films have been grown on (0001) 4H-SiC substrates at 1030 °C via continuous flow and discontinuous flow-modulated chemical vapor deposition techniques using diborane (B2H6) and ammonia (NH3) as the B and N sources, respectively. The latter technique enabled observations of both the effect of hydrogen purge steps between precursor injections and the length of injection times for B2H6 on the stoichiometry and microstructure of the films. Stoichiometric BN was achieved in all films grown continuously within the N/B gas phase ratio range of 20–200; this was not observed for the discontinuously grown films unless both the B2H6 flow rate and the injection time were minimized. Cross-sectional transmission electron microscopy of films grown both continuously and discontinuously at N/B = 200 and using short B2H6 injection times relative to that of NH3 for the latter process route revealed the initial growth of ∼4 nm thick partially ordered sp2-BN layers. A transition zone then formed containing randomly oriented polycrystalline grains. Excess B incorporated into the discontinuously grown films during long B2H6 injection times resulted in single layer mixtures of amorphous and sp2-BN without any observed ordering.
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来源期刊
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A 工程技术-材料科学:膜
CiteScore
5.10
自引率
10.30%
发文量
247
审稿时长
2.1 months
期刊介绍: Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.
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