X. Tao, K. Reis, B. Haby, M. Karnett, N. White, C. Watts, M. Delgado, K. Gardner, K. R. Harris
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引用次数: 8
摘要
电微探头和无源电压对比(PVC)技术用于研究我们的0.20 um FEOL(前端线)表征和工艺鉴定车辆上未完全填充的触点和过孔。未填充钨塞的失效机理是金属后蚀刻溶剂带过程中的电化学腐蚀。这种钨塞腐蚀导致高接触和通孔失败率、屈服影响预测模型失效、电迁移测试失败,以及最终测试中3%至6%的屈服损失。为了确定和解决腐蚀塞的失效机制,进行了一些详细的实验。结果表明,对钨基CMP buff进行改性可以显著降低探针的故障率,提高探针的成品率,提高探针的可制造性。
Failure rate and yield-limiting tungsten plug corrosion diagnosis using characterization test vehicles
Electrical microprobe and Passive Voltage Contrast (PVC) techniques were used to investigate incompletely filled contacts and vias on our 0.20 um FEOL (Front-End-Of-Line) characterization and process qualification vehicles. The failure mechanism of unfilled tungsten plugs was attributed to electrochemical corrosion during the post-metal etch solvent strip. This tungsten plug corrosion led to high contact and via failure rates, failure of the yield impact prediction model, electromigration test failure, and 3% to 6% yield loss at final test. Several detailed experiments were performed towards identifying and resolving this corrosion plug failure mechanism. It was found that modification of the Tungsten CMP buff significantly reduced the failure rate and led to increased probe yield with improved manufacturability.