直写光刻的杂化结构——纳米压印对灰度光刻胶对比度和表面形貌的调节

IF 1.4 4区 工程技术
Sijia Xie, J. Erjawetz, C. Schuster, H. Schift
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引用次数: 5

摘要

结合不同尺寸的微结构得益于混合制造策略,即使用纳米压印生成规则的大面积结构,使用激光光刻生成更大的灰度形貌。虽然单个工艺很简单,但由于用于灰度光刻的正抗蚀剂的热塑性特性,表面光栅上的衍射和光活性物质的降解需要仔细选择工艺步骤的顺序,以及工艺,温度和尺寸的平衡。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint
Combining microstructures of different dimensions benefits from hybrid manufacturing strategies that use nanoimprint for generating regular large area structures and laser lithography for larger grayscale topography. While the individual processes are straightforward, due to the thermoplastic property of the positive resist used for grayscale lithography, diffraction on surface gratings and degradation of photoactive substances require a careful choice of the order of process steps, and balance of process, temperatures, and dimensions.
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来源期刊
Journal of Vacuum Science & Technology B
Journal of Vacuum Science & Technology B 工程技术-工程:电子与电气
自引率
14.30%
发文量
0
审稿时长
2.5 months
期刊介绍: Journal of Vacuum Science & Technology B emphasizes processing, measurement and phenomena associated with micrometer and nanometer structures and devices. Processing may include vacuum processing, plasma processing and microlithography among others, while measurement refers to a wide range of materials and device characterization methods for understanding the physics and chemistry of submicron and nanometer structures and devices.
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