3D-IC封装技术的高速电气设计研究

R. Sung, K. Chiang, D. Lee, M. Ma
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引用次数: 2

摘要

随着封装技术的进步,对耗电需求的增加,要求在更小的空间内实现更多功能或增加器件的密度。通过3D-IC技术的能力,它可以支持更小尺寸,高速和多功能的设计。其中一项3d集成电路技术是通过硅通孔(TSV)堆叠技术,它起着非常重要的作用。它缩短了路径,从而增加了设备的带宽。在本研究中,我们评估了通常的高速电气设计中的TSV效应。有两个问题,阻抗控制和隔离。利用仿真求解器对不同设计模型在这两个问题上的性能进行了评估。并且,这一结果应该对用于3d集成电路技术的中间衬底设计的发展有益。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-speed electrical design study for 3D-IC packaging technology
As the advance of the packaging technology for the electrical consuming demands, it requires for more functions or increasing the density of devices within a smaller space. By the capabilities of the 3D-IC technology, it could support a design included smaller size, high-speed and multi-functions. One of the 3D-IC techs, the stacking with Through-Silicon-Via (TSV), plays a very important role. It shortens the path, and hence, increases the bandwidth of the device. In this study, we evaluate the TSV effects in usual high-speed electrical designs. There are two issues, the impedance-control and isolation. By using the EM simulation solver, we estimate the performances of different designed models about these two issues. And, this result should have the benefits for the development on the designs in the interposer substrates used for 3D-IC technology.
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