{"title":"超低功耗设计和未来设备交互","authors":"A. Amerasekera, C. Bittlestone","doi":"10.1109/IEDM.2012.6478972","DOIUrl":null,"url":null,"abstract":"We present the interactions between the process technology and the design that set the requirements for ultra low power and mixed signal circuits and chips that form the basis of the next generations of semiconductor applications.","PeriodicalId":6376,"journal":{"name":"2012 International Electron Devices Meeting","volume":"4 1","pages":"3.4.1-3.4.4"},"PeriodicalIF":0.0000,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Ultra low power design and future device interactions\",\"authors\":\"A. Amerasekera, C. Bittlestone\",\"doi\":\"10.1109/IEDM.2012.6478972\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present the interactions between the process technology and the design that set the requirements for ultra low power and mixed signal circuits and chips that form the basis of the next generations of semiconductor applications.\",\"PeriodicalId\":6376,\"journal\":{\"name\":\"2012 International Electron Devices Meeting\",\"volume\":\"4 1\",\"pages\":\"3.4.1-3.4.4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2012.6478972\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2012.6478972","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ultra low power design and future device interactions
We present the interactions between the process technology and the design that set the requirements for ultra low power and mixed signal circuits and chips that form the basis of the next generations of semiconductor applications.
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