高熵合金CrFeNiCoCu溅射沉积薄膜:结构、电学性能和氧化

IF 2.4 3区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
J. Mayandi, M. Schrade, P. Vajeeston, M. Stange, A. Lind, M. Sunding, J. Deuermeier, E. Fortunato, O. Løvvik, A. Ulyashin, S. Diplas, P. Carvalho, T. Finstad
{"title":"高熵合金CrFeNiCoCu溅射沉积薄膜:结构、电学性能和氧化","authors":"J. Mayandi, M. Schrade, P. Vajeeston, M. Stange, A. Lind, M. Sunding, J. Deuermeier, E. Fortunato, O. Løvvik, A. Ulyashin, S. Diplas, P. Carvalho, T. Finstad","doi":"10.1116/6.0001394","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":null,"pages":null},"PeriodicalIF":2.4000,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation\",\"authors\":\"J. Mayandi, M. Schrade, P. Vajeeston, M. Stange, A. Lind, M. Sunding, J. Deuermeier, E. Fortunato, O. Løvvik, A. Ulyashin, S. Diplas, P. Carvalho, T. Finstad\",\"doi\":\"10.1116/6.0001394\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":17490,\"journal\":{\"name\":\"Journal of Vacuum Science & Technology A\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.4000,\"publicationDate\":\"2022-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Vacuum Science & Technology A\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1116/6.0001394\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, COATINGS & FILMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology A","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1116/6.0001394","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 3

摘要

本文章由计算机程序翻译,如有差异,请以英文原文为准。
High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A 工程技术-材料科学:膜
CiteScore
5.10
自引率
10.30%
发文量
247
审稿时长
2.1 months
期刊介绍: Journal of Vacuum Science & Technology A publishes reports of original research, letters, and review articles that focus on fundamental scientific understanding of interfaces, surfaces, plasmas and thin films and on using this understanding to advance the state-of-the-art in various technological applications.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信