晶圆级LED封装,集成DRIE沟槽封装

Rong Zhang, S. Lee
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引用次数: 28

摘要

提出了一种新的晶圆级LED阵列封装工艺。在该工艺中,4英寸p型单晶硅片作为倒装LED芯片的衬底。采用晶圆级光刻和电镀工艺制备晶圆基板。采用紫外光固化环氧树脂作为包封剂。该封装工艺利用深反应离子蚀刻(deep reaction ion etching, DRIE)工艺制备的方形沟槽作为屏障,限制环氧封装剂的扩散,并通过控制环氧树脂的体积和沟槽的尺寸来调整封装的几何形状。LED阵列的封装和封装工艺在晶圆级完成。晶圆切割后可直接获得LED封装。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Wafer level LED packaging with integrated DRIE trenches for encapsulation
A novel encapsulation process for wafer level LED arrays is presented. In this process, 4 inch P-type single crystal silicon wafers served as the substrates for flip-chip mountable LED chips. The wafer substrates were fabricated by wafer level lithography and plating process. An UV curable epoxy was applied as the encapsulant. The encapsulation process takes advantage of square trenches fabricated by deep reaction ion etching (DRIE) process as barriers to limit the spread of the epoxy encapsulant, and can adjust the geometry of the encapsulation via controlling the volume of the epoxy and the dimension of the trenches. The packaging and encapsulation process of LED arrays were completed on wafer level. LED packages can be directly obtained after wafer dicing.
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