在热原子层蚀刻中，通过精确的反应物剂量来控制高纵横比孔的蚀刻轮廓

{"title":"在热原子层蚀刻中，通过精确的反应物剂量来控制高纵横比孔的蚀刻轮廓","authors":"A. Fischer, Aaron Routzahn, Ryan J. Gasvoda, Jim Sims, T. Lill","doi":"10.1116/6.0001691","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":17490,"journal":{"name":"Journal of Vacuum Science & Technology A","volume":"136 1","pages":""},"PeriodicalIF":2.4000,"publicationDate":"2022-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching\",\"authors\":\"A. Fischer, Aaron Routzahn, Ryan J. Gasvoda, Jim Sims, T. Lill\",\"doi\":\"10.1116/6.0001691\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":17490,\"journal\":{\"name\":\"Journal of Vacuum Science & Technology A\",\"volume\":\"136 1\",\"pages\":\"\"},\"PeriodicalIF\":2.4000,\"publicationDate\":\"2022-03-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Vacuum Science & Technology A\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1116/6.0001691\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, COATINGS & FILMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology A","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1116/6.0001691","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}