杂散场对尺度MRAM垂直MTJ开关特性的影响

Yung-Hung Wang, Sheng-Huang Huang, Ding-Yeong Wang, K. Shen, C. Chien, Keng-Ming Kuo, Shan-Yi Yang, D. Deng
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引用次数: 22

摘要

本文首次揭示了垂直磁隧道结(pMTJs)钉住层的杂散场(Hs)具有多重重要作用:其面外分量降低了钉住层的稳定性,而其面内分量则有助于自旋传递转矩的切换。通过杂散场工程,既能保留其优势,又能将其不利影响降到最低。我们还证明了蚀刻工艺在杂散场工程中起着至关重要的作用。我们的pMTJ具有强大的钉住层性能,对称的R-H回路和平衡的自旋转矩开关电流。对于直径为80nm的pMTJ,我们的开关电流为~60uA@20us。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of stray field on the switching properties of perpendicular MTJ for scaled MRAM
For the first time, we show the stray field (Hs) from the pinned layer of perpendicular magnetic tunnel junctions (pMTJs) plays multiple important roles: its out-of-plane component degrades pinned layer stability of scaled MTJ, while its in-plane component assists spin-transfer torque switching. Through stray field engineering, one can retain its advantage, and minimized its detrimental effect. We also show that etching process plays a vital role in the stray-field engineering. Our pMTJ exhibits robust pinned layer performance, symmetrical R-H loop and balanced spin-torque switching current. The switching current of our pMTJ is ~60uA@20us for a 80nm diameter pMTJ.
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