高迁移率氧化锌氮化tft,在光照偏应力条件下具有稳定的操作,适用于大面积和高分辨率显示应用

Myungkwan Ryu, Tae Sang Kim, K. Son, Hyun-Suk Kim, Joonsuk Park, Jong‐Baek Seon, Seok-Jun Seo, Sun‐Jae Kim, Eunha Lee, Hyungik Lee, S. Jeon, Seungwu Han, Sang Yoon Lee
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引用次数: 20

摘要

我们在第一性原理计算和TFT评价的基础上研究了ZnON的材料和电学性质。理论上,ZnON具有高迁移率特性和高稳定性的能带结构。制备的tft具有高迁移率(100 cm2/Vs),均匀性好,在光照射偏压条件下vth位移-2.87 V等稳定的工作性能。作为一种克服氧化物半导体性能限制的新方法,ZnON技术有望实现下一代显示器所需的高移动性和操作稳定性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High mobility zinc oxynitride-TFT with operation stability under light-illuminated bias-stress conditions for large area and high resolution display applications
We have investigated material and electrical properties of ZnON based on 1st principle calculations and TFT evaluations. Theoretically, ZnON has high mobility characteristics and band-structure for high stability. Fabricated TFTs exhibited high mobility (100 cm2/Vs), good uniformity, and stable operation performance such as -2.87 V of Vth-shift under light illuminated bias-stress condition. As a new approach to overcome the performance limit of oxide-semiconductors, ZnON technology is strongly promising to achieve high mobility and operation stability required for next generation displays.
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