采用3-D三栅极和高k/金属栅极的22nm SoC平台技术,针对超低功耗、高性能和高密度SoC应用进行了优化

Chia-Hong Jan, U. Bhattacharya, R. Brain, S. Choi, G. Curello, G. Gupta, Walid M. Hafez, M. Jang, M. Kang, K. Komeyli, T. Leo, N. Nidhi, L. Pan, Park Joodong, K. Phoa, Arifur Rahman, C. Staus, H. Tashiro, Tsai Curtis, P. Vandervoorn, Laurence T. Yang, J. Yeh, P. Bai
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引用次数: 278

摘要

领先的22nm 3-D三栅极晶体管技术首次针对低功耗SoC产品进行了优化。低待机功率和高压晶体管利用优越的短通道控制,<;三栅极架构的65mV/dec亚阈值斜率和< 40mV DIBL与单个SoC芯片中的高速逻辑晶体管同时制造,从而在创纪录的低泄漏水平下实现行业领先的驱动电流。采用NMOS/PMOS Idsat=0.41/0.37mA/um, 30pA/um off, 0.75V,构建低待机功率380Mb SRAM,工作频率为2.6GHz,待机漏损为10pA/cell。该技术提供晶体管类型的混配灵活性、高密度互连堆栈和RF/混合信号功能,在移动、手持、无线和嵌入式SoC产品中处于领先地位。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 22nm SoC platform technology featuring 3-D tri-gate and high-k/metal gate, optimized for ultra low power, high performance and high density SoC applications
A leading edge 22nm 3-D tri-gate transistor technology has been optimized for low power SoC products for the first time. Low standby power and high voltage transistors exploiting the superior short channel control, <; 65mV/dec subthreshold slope and <;40mV DIBL, of the Tri-Gate architecture have been fabricated concurrently with high speed logic transistors in a single SoC chip to achieve industry leading drive currents at record low leakage levels. NMOS/PMOS Idsat=0.41/0.37mA/um at 30pA/um Ioff, 0.75V, were used to build a low standby power 380Mb SRAM capable of operating at 2.6GHz with 10pA/cell standby leakages. This technology offers mix-and-match flexibility of transistor types, high-density interconnect stacks, and RF/mixed-signal features for leadership in mobile, handheld, wireless and embedded SoC products.
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