酸对铜电镀快速通孔填充的影响

Jhih-Jyun Yan, Liang-chun Chang, Chun-Wei Lu, W. Dow, A. Liu, David W. Wang
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引用次数: 1

摘要

采用单一有机添加剂对印刷电路板进行了镀铜通孔填充。有机添加剂对酸的抑制作用较敏感。我们选择不同种类不同浓度的有机酸作为支撑电解质,实现TH铜填充,这被称为蝴蝶技术(BFT)。为了缩短电镀时间,高电流密度是必要的,但它必须与提高氯离子浓度和强制对流相结合。这些组合可以显著提高镀铜溶液的填充性能。在光学显微镜下观察所有电镀结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effect of acid on fast through-hole filling by Cu electroplating
Through-holes (TH) filling of printed circuit board (PCB) by copper electroplating using single organic additive was carried out. The inhibition of the organic additive was sensitive to acid. We chose different kind of organic acids with different concentrations as supporting electrolytes to achieve TH copper filling, which was called butterfly technology (BFT). To reduce plating time, high current density was necessary but it had to combine with raising the concentration of chloride ions and force convection. These combinations can significantly improve the filling performance of the copper plating solution. All of the results of electroplating were observed by optical microscope (OM).
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