ZnO表面欧姆接触研究进展

Y. Lv, L. Wan
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引用次数: 10

摘要

氧化锌作为紫外光发射器、压敏电阻、透明大功率电子器件、表面声波器件、压电换能器、化学和气体传感器的优秀候选者,可以集成在SiP(系统级封装)中。SiP是传感器网络中传感器节点的重要组成部分。通常情况下,SiP中的ZnO器件是由纳米级薄膜制成的,可以与其他材料兼容并在封装中进行加工。然而,尽管在电子和光子应用方面具有巨大的潜力,但ZnO器件的制造很难获得良好的欧姆接触。低电阻和热稳定的欧姆接触是实现高性能zno基器件的关键。本文对近年来氧化锌上欧姆接触的研究进展进行了分析和综述。讨论了半导体与金属界面处能带弯曲的机理。总结了形成高质量ZnO薄膜的因素,如衬底和沉积方法的选择、接触电阻和欧姆触点热稳定性的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Recent progress of ohmic contact on ZnO
ZnO as an excellent candidate for UV light emitters, varistors, transparent high-power electronics, surface acoustic wave devices, piezoelectric transducers, and chemical and gas sensors could be integrated in a SiP (system-in-package). The SiP could be a critical part in sensor nodes in a sensor network. Normally, the ZnO device in SiP is fabricated with nanoscale films which can be compatible with other materials and processing in a package. However, despite the great potential for electron and photonic applications, ZnO device fabrication is difficult to obtain good ohmic contact. The low resistance and thermal stable ohmic contacts is critical to realize high-performance ZnO-based devices. In this paper, the recent advances of ohmic contacts on ZnO are analyzed and reviewed. The mechanism of the energy band bending at the interface of the semiconductor and the metal is discussed. The factors of forming good quality ZnO films such as the choice of the substrate and the method to deposit ZnO film, the effect of the contact resistance and thermal stability of ohmic contacts are summarized.
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