{"title":"CMOS互连传输线测量与新探头垫模型","authors":"Chien-Chang Huang","doi":"10.1109/IMPACT.2011.6117236","DOIUrl":null,"url":null,"abstract":"In this paper, the complete models and measured results are presented for the probe pad in the CMOS on-wafer transmission line measurements using L-2L deembedding method. The transmission line parameters including characteristic impedance and propagation constant are acquired for broadband operation. The π-/T-network instead of the conventional shunt/series configuration for the probe pad are proposed with detail expressions for parameter extractions. Due to the under-determined condition for the parameter extraction, the iteration procedure is utilized. The measured results for the thin-film microstrip lines built by the 0.18 μm 1P6M process are shown from 0.2 GHz to 50 GHz.","PeriodicalId":6360,"journal":{"name":"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)","volume":"28 1","pages":"107-110"},"PeriodicalIF":0.0000,"publicationDate":"2011-12-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"CMOS interconnect transmission line measurements with new probe pad models\",\"authors\":\"Chien-Chang Huang\",\"doi\":\"10.1109/IMPACT.2011.6117236\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, the complete models and measured results are presented for the probe pad in the CMOS on-wafer transmission line measurements using L-2L deembedding method. The transmission line parameters including characteristic impedance and propagation constant are acquired for broadband operation. The π-/T-network instead of the conventional shunt/series configuration for the probe pad are proposed with detail expressions for parameter extractions. Due to the under-determined condition for the parameter extraction, the iteration procedure is utilized. The measured results for the thin-film microstrip lines built by the 0.18 μm 1P6M process are shown from 0.2 GHz to 50 GHz.\",\"PeriodicalId\":6360,\"journal\":{\"name\":\"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)\",\"volume\":\"28 1\",\"pages\":\"107-110\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-12-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMPACT.2011.6117236\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMPACT.2011.6117236","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
CMOS interconnect transmission line measurements with new probe pad models
In this paper, the complete models and measured results are presented for the probe pad in the CMOS on-wafer transmission line measurements using L-2L deembedding method. The transmission line parameters including characteristic impedance and propagation constant are acquired for broadband operation. The π-/T-network instead of the conventional shunt/series configuration for the probe pad are proposed with detail expressions for parameter extractions. Due to the under-determined condition for the parameter extraction, the iteration procedure is utilized. The measured results for the thin-film microstrip lines built by the 0.18 μm 1P6M process are shown from 0.2 GHz to 50 GHz.