Yuquan Li, R.W. Johnson, R. Zhang, P. Henson, P. Thompson, T. Hooghan, J. Libres
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引用次数: 4
摘要
本文研究了一种大功率倒装片内封装应用的铟焊料散热器附件。Cu散热器采用Ni/Au金属化,倒装芯片背面采用Ti/Au金属化。采用真空焊接实现了低空穴附着工艺。初焊后Au薄膜完全转化为AuIn2,但未观察到Ti和In之间形成金属间化合物(IMC)。剪切试验表明,该附着体具有良好的机械强度。经过多次无铅焊料回流或120°C热时效后,抗剪强度没有明显下降。在热冲击循环试验(-40℃~ 85℃)中,Ti/Au (2000 A¿of Au)金属化的模具出现了早期的局部分层。进一步评价了金的厚度对机械强度的影响。与Ti/Au (3000 A¿)和Ti/Au (4000 A¿)模具相比,Ti/Au (2000 A¿)模具组件(Cu on Si)具有较低的剪切强度。拉伸强度(Si on Si)随金厚度的增加而增加。热冲击测试(-40°C至85°C)对Ti/Au 3000 A¿和Ti/Ni/Au(对照)组件没有显示早期分层,并且在2000次循环后具有相似的性能。
Ti/Au Die Backside Metallization for Flip Chip Heat Spreader Attachment
In this paper, a heat spreader attachment with indium solder for high-power flip chip-in-package application was investigated. The Cu heat spreader was metallized with Ni/Au and the flip chip die backside metallization was Ti/Au. A low voiding attachment process was achieved with vacuum soldering. The Au thin film was converted into AuIn2 completely after initial soldering, but no intermetallic compund (IMC) formation between Ti and In was observed. The attachment had good mechanical strength as measured by shear testing. The shear strength was not degraded significantly after multiple lead free solder reflows or with thermal aging at 120°C. For thermal shock cycle test (-40°C to 85°C), die with Ti/Au (2000 A¿ of Au) metallization had early partial delamination. The effect of Au thickness on mechanical strength was further evaluated. Assemblies (Cu on Si) with Ti/Au (2000 A¿) die had lower shear strength compared with Ti/Au (3000 A¿) and Ti/Au (4000 A¿ ) die. The pull strength (Si on Si) increased with increasing gold thickness. Thermal shock testing (-40°C to 85°C) for assemblies with Ti/Au 3000 A¿ along with Ti/Ni/Au (control) did not show early delamination and had similar performance after 2000 cycles.