Zachary Schaffer, G. Piazza, S. Mishin, Y. Oshmyansky
{"title":"20%掺钪氮化铝的超高频简单工艺流横截面lam<s:1>模式谐振器","authors":"Zachary Schaffer, G. Piazza, S. Mishin, Y. Oshmyansky","doi":"10.1109/MEMS46641.2020.9056279","DOIUrl":null,"url":null,"abstract":"This paper presents a promising device design for Super High Frequency (SHF) Lateral Field Excitation Cross-sectional Lamé Mode Resonators (LFE CLMRs). Advancements over the state-of-the-art are made possible by harnessing the full capabilities of 20% Scandium doped Aluminum Nitride (ScAlN) through a very simple fabrication process that relies only on 2 masks (Fig. 2). The impact of top metal selection is explored, and metal reflector-based cavity definition is used to ease etching tolerance in fabrication. These design considerations result in SHF devices in which ScAlN can be deposited on bare Si, ScAlN sidewall definition is not critical, and piezoelectric film thickness of $1.0-0.5\\ \\mu \\mathrm{m}$ can be used to define resonators operating between 3 and 6 GHz. Design is experimentally validated through fabrication of 20% ScAlN resonators operating around 3 GHz with static capacitance of 0.7 pF—for use in $50\\ \\Omega$ matched filters—with electromechanical coupling coefficient ($k_{t}{}^{2}$) of 5.0-6.5%, and quality factor at series resonance $(Q_{s}) > 500$.","PeriodicalId":6776,"journal":{"name":"2020 IEEE 33rd International Conference on Micro Electro Mechanical Systems (MEMS)","volume":"22 3","pages":"1281-1284"},"PeriodicalIF":0.0000,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"19","resultStr":"{\"title\":\"Super High Frequency Simple Process Flow Cross-Sectional Lamé Mode Resonators in 20% Scandium-Doped Aluminum Nitride\",\"authors\":\"Zachary Schaffer, G. Piazza, S. Mishin, Y. Oshmyansky\",\"doi\":\"10.1109/MEMS46641.2020.9056279\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a promising device design for Super High Frequency (SHF) Lateral Field Excitation Cross-sectional Lamé Mode Resonators (LFE CLMRs). Advancements over the state-of-the-art are made possible by harnessing the full capabilities of 20% Scandium doped Aluminum Nitride (ScAlN) through a very simple fabrication process that relies only on 2 masks (Fig. 2). The impact of top metal selection is explored, and metal reflector-based cavity definition is used to ease etching tolerance in fabrication. These design considerations result in SHF devices in which ScAlN can be deposited on bare Si, ScAlN sidewall definition is not critical, and piezoelectric film thickness of $1.0-0.5\\\\ \\\\mu \\\\mathrm{m}$ can be used to define resonators operating between 3 and 6 GHz. Design is experimentally validated through fabrication of 20% ScAlN resonators operating around 3 GHz with static capacitance of 0.7 pF—for use in $50\\\\ \\\\Omega$ matched filters—with electromechanical coupling coefficient ($k_{t}{}^{2}$) of 5.0-6.5%, and quality factor at series resonance $(Q_{s}) > 500$.\",\"PeriodicalId\":6776,\"journal\":{\"name\":\"2020 IEEE 33rd International Conference on Micro Electro Mechanical Systems (MEMS)\",\"volume\":\"22 3\",\"pages\":\"1281-1284\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"19\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 IEEE 33rd International Conference on Micro Electro Mechanical Systems (MEMS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MEMS46641.2020.9056279\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE 33rd International Conference on Micro Electro Mechanical Systems (MEMS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMS46641.2020.9056279","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 19
摘要
提出了一种超高频横向场激励横截面lam模谐振器(LFE CLMRs)的器件设计方案。通过利用20的全部能力,使先进的技术成为可能% Scandium doped Aluminum Nitride (ScAlN) through a very simple fabrication process that relies only on 2 masks (Fig. 2). The impact of top metal selection is explored, and metal reflector-based cavity definition is used to ease etching tolerance in fabrication. These design considerations result in SHF devices in which ScAlN can be deposited on bare Si, ScAlN sidewall definition is not critical, and piezoelectric film thickness of $1.0-0.5\ \mu \mathrm{m}$ can be used to define resonators operating between 3 and 6 GHz. Design is experimentally validated through fabrication of 20% ScAlN resonators operating around 3 GHz with static capacitance of 0.7 pF—for use in $50\ \Omega$ matched filters—with electromechanical coupling coefficient ($k_{t}{}^{2}$) of 5.0-6.5%, and quality factor at series resonance $(Q_{s}) > 500$.
Super High Frequency Simple Process Flow Cross-Sectional Lamé Mode Resonators in 20% Scandium-Doped Aluminum Nitride
This paper presents a promising device design for Super High Frequency (SHF) Lateral Field Excitation Cross-sectional Lamé Mode Resonators (LFE CLMRs). Advancements over the state-of-the-art are made possible by harnessing the full capabilities of 20% Scandium doped Aluminum Nitride (ScAlN) through a very simple fabrication process that relies only on 2 masks (Fig. 2). The impact of top metal selection is explored, and metal reflector-based cavity definition is used to ease etching tolerance in fabrication. These design considerations result in SHF devices in which ScAlN can be deposited on bare Si, ScAlN sidewall definition is not critical, and piezoelectric film thickness of $1.0-0.5\ \mu \mathrm{m}$ can be used to define resonators operating between 3 and 6 GHz. Design is experimentally validated through fabrication of 20% ScAlN resonators operating around 3 GHz with static capacitance of 0.7 pF—for use in $50\ \Omega$ matched filters—with electromechanical coupling coefficient ($k_{t}{}^{2}$) of 5.0-6.5%, and quality factor at series resonance $(Q_{s}) > 500$.