CMOS 16FF数字功率放大器射频可靠性表征

IF 2.2 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE
L. Zohar;I. Shternberg;B. Khamaisi;A. Nazimov;A. Ben-Bassat;O. Degani
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引用次数: 0

摘要

本文描述了采用CMOS acrlong 16FF技术制造的开关电容数字功率放大器(SCDPA)的可靠性表征过程。功率放大器(PA)在RF频率(2.4和5–7 GHz)下工作,其中晶体管端子上的瞬时电压可能超过工艺技术允许的最大额定电压Vmax。由于射频条件下可靠性退化的可用技术模型有限,因此对可能的故障机制进行了详细的设计分析,然后在射频条件下操作时收集了产品数据。在这封信中,我们描述了这一过程,包括SCDPA可靠性风险评估和压力实验。我们解释了在SCDPA中,VDD电压对故障加速至关重要,而不是输出功率(如在模拟功率放大器(PA)中)。我们还表明,最初的设计受到pMOS负偏置温度不稳定性(NBTI)的影响,这导致了二次谐波的退化。NBTI问题通过一种新颖的设计得到了克服,在该设计中,体电压被动态改变,以降低SCDPA pMOS晶体管上的有效源极-栅极电压(Vsg)。为了强调SCDPA,我们使用了一种设置,其中SCDPA传输连续波形(CW)以及电压和温度加速度。最后,我们展示了动态体电压解决方案是如何成功克服NBTI退化的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
CMOS 16FF Digital Power Amplifier RF Reliability Characterization
This letter describes the reliability characterization process of switched capacitor digital power amplifier (SCDPA) manufactured in CMOS acrlong 16FF technology. Power amplifiers (PAs) operate at RF frequencies (2.4 and 5–7 GHz) in which the instantaneous voltage on the transistor terminals might exceed the maximum rated voltage, Vmax allowed by the process technology. Since the available technology models for reliability degradation under RF conditions are limited, a detailed design analysis for possible failure mechanisms was done, followed by product data collection while operating in RF. In this letter, we describe this process, including SCDPA reliability risk assessment and stress experiments. We explain how in SCDPA the VDD voltage is critical for failure acceleration and not the output power (as in analog power amplifier (PA). We also show that the initial design suffered from pMOS negative bias temperature instability (NBTI) which resulted in 2nd harmonics degradation. The NBTI issue was overcome by a novel design in which the bulk voltage is dynamically changed to lower the effective source–gate voltage (Vsg) on the SCDPA pMOS transistors. To stress the SCDPA, we used a setup in which the SCDPA transmits a continuous waveform (CW) along with voltage and temperature acceleration. Finally, we show how the dynamic bulk voltage solution was successful in overcoming the NBTI degradation.
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来源期刊
IEEE Solid-State Circuits Letters
IEEE Solid-State Circuits Letters Engineering-Electrical and Electronic Engineering
CiteScore
4.30
自引率
3.70%
发文量
52
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