改善闸流管抖动特性的驱动电源设计

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Tae-Hyun Kim;Shin Kim;Jung-Soo Bae;Seong-Ho Son;Chang-Hyun Kwon;Chan-Hun Yu;Hyoung-Suk Kim;Sung-Roc Jang;Suk-Ho Ahn
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引用次数: 0

摘要

本文介绍了驱动大功率闸流管开关的电源设计。为了改善闸流管的延时抖动,设计了三种驱动电源(触发器、阴极加热器和蓄热器)。触发电源(TPS)是一种基于开路开关的电感储能系统,能够产生可控的输出脉冲电压(1 ~ 10kv)和脉冲能量(1 ~ 5mj),用于闸流管开关特性的研究。根据阴极加热器(8 V, 100 A)和储热器(8 V, 25 A)电源的规格,${LCC}$谐振变换器被设计为使用它们的软开关特性。由于输出纹波影响闸流管的开关特性,变换器的高频工作允许用最小的输出滤波器减少纹波。三种电源的设计通过单独的额定操作以及L4888闸流管的实验进行了验证。基于电源工作条件分析了L4888闸流管的开关特性,实现了152ps的rms延迟时间抖动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design of Driving Power Supplies for Improvement of Thyratron Jitter Characteristic
This article describes designs for power supplies for driving a high-power thyratron switch. To improve the delay time jitter of the thyratron, three driving power supplies (trigger, cathode heater, and reservoir heater) are designed. Based on inductive energy storage (IES) with an opening switch, the trigger power supply (TPS) is designed to generate controllable output pulse voltage (1–10 kV) as well as pulse energy (1–5 mJ) for investigating thyratron switching features. Depending on the specifications of the cathode heater (8 V, 100 A) and reservoir heater (8 V, 25 A) power supply, ${LCC}$ resonant converters are designed to use their soft-switching properties. Since the output ripples affect the thyratron switching characteristics, the high-frequency operation of the converter allows for reducing ripples with a minimized output filter. Designs of three power supplies were verified from individual rated operations as well as experiments with L4888 thyratron. Switching features of the L4888 thyratron were analyzed based on operating conditions of power supplies and 152 ps of rms delay time jitter was achieved.
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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