{"title":"OpenDFM弥合DRC和DFM之间的差距","authors":"J. Buurma, R. Sayah, F. Valente, C. Rodgers","doi":"10.1109/MDT.2012.2210380","DOIUrl":null,"url":null,"abstract":"This paper presents the details of a standard, named OpenDFM, which describes an efficient method to ensure manufacturability of integrated circuits that are designed at advanced technology nodes of today and one that can scale to address similar issues at future nodes as well. OpenDFM uses a meta-language format to capture and improve critical patterns that must be tested to ensure correct manufacturing and thus enhance yield.","PeriodicalId":50392,"journal":{"name":"IEEE Design & Test of Computers","volume":"29 1","pages":"84-90"},"PeriodicalIF":0.0000,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/MDT.2012.2210380","citationCount":"1","resultStr":"{\"title\":\"OpenDFM Bridging the Gap Between DRC and DFM\",\"authors\":\"J. Buurma, R. Sayah, F. Valente, C. Rodgers\",\"doi\":\"10.1109/MDT.2012.2210380\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents the details of a standard, named OpenDFM, which describes an efficient method to ensure manufacturability of integrated circuits that are designed at advanced technology nodes of today and one that can scale to address similar issues at future nodes as well. OpenDFM uses a meta-language format to capture and improve critical patterns that must be tested to ensure correct manufacturing and thus enhance yield.\",\"PeriodicalId\":50392,\"journal\":{\"name\":\"IEEE Design & Test of Computers\",\"volume\":\"29 1\",\"pages\":\"84-90\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1109/MDT.2012.2210380\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Design & Test of Computers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MDT.2012.2210380\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Design & Test of Computers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MDT.2012.2210380","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
This paper presents the details of a standard, named OpenDFM, which describes an efficient method to ensure manufacturability of integrated circuits that are designed at advanced technology nodes of today and one that can scale to address similar issues at future nodes as well. OpenDFM uses a meta-language format to capture and improve critical patterns that must be tested to ensure correct manufacturing and thus enhance yield.
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