超越CMOS逻辑和存储器的氧化物电子客座编辑专题

IF 2 Q3 COMPUTER SCIENCE, HARDWARE & ARCHITECTURE
Dmitri E. Nikonov
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引用次数: 0

摘要

众所周知,几十年来,传统的电子器件以及探索性逻辑器件和存储器件都依赖于单元素或双元素半导体。氧化物在电容器介质、绝缘、隧道屏障等方面起着不可缺少的作用,但仍然是次要的作用。氧化物的功能(如导电、铁电性、磁性/自旋、压电、离子漂移、金属绝缘体跃迁等)在这段时间内从材料科学方面进行了研究。然而,基于这些属性的现实计算设备的工作在过去十年中才真正起飞。氧化物允许更广泛的现象,可以利用(多铁材料,自旋波,仅举几例)。它们需要比传统半导体更复杂的理论处理(如间接交换、Dzyaloshinskii-Moriya相互作用和拓扑材料)。在某些情况下,单晶状态和接近原子平面的界面需要新的制造方法。所有这些都为推进计算提供了令人兴奋的机会。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Guest Editorial Special Topic on Oxide Electronics for Beyond CMOS Logic and Memory
As is well known, the traditional electronics as well as exploratory logic and memory devices have relied on mono- or bi-elemental semiconductors for many decades. Oxides served an indispensable, but still secondary role of capacitor dielectrics, insulation, tunneling barriers, and so on. The functionality of oxides putting them at the center stage of computing (such as conduction, ferroelectricity, magnetic/spin, piezoelectric, ion drift, metal–insulator transitions, etc.) was researched from the material science side throughout this time. However, the work on realistic computing devices based on these properties really took off in the past decade. Oxides allow for a wider variety of phenomena which can be utilized (multiferroic materials, spin waves, to name a few). They require more sophisticated theoretical treatment (such as indirect exchange, Dzyaloshinskii–Moriya interaction, and topological materials) than traditional semi-conductors. In some cases, the single crystal state and close to atomically flat interfaces require novel fabrication methods. All these provide exciting opportunities to advance computing.
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来源期刊
CiteScore
5.00
自引率
4.20%
发文量
11
审稿时长
13 weeks
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