915 mhz常压空气微波等离子体炬(MPT)参数的测定

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Ziyao Jie;Cheng Liu;Daolu Xia;Zhibo Zhang;Xuewei Zhao;Guixin Zhang
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引用次数: 2

摘要

气体温度、电子温度和电子密度是工业应用中影响微波等离子体化学过程的关键参数。利用光学发射光谱(OES)研究了915 mhz常压空气微波等离子体炬(MPT)在不同吸收功率水平和径向位置下的气体温度和电子密度。此外,分析了915 mhz大气压氩微波等离子体细丝的电子温度随吸收功率的变化规律。实验结果表明:1)吸收功率对径向气体温度和电子密度影响不大;2) 915 mhz大气压空气MPT存在集肤效应,造成径向气体温度分布中心空穴;3)在915 mhz大气压空气MPT中心,电子密度达到约$2\ × 10$ 13 cm−3,对吸收功率的变化几乎不敏感;4)当吸收功率从2.0 kW增加到6.3 kW时,915 mhz大气压微波等离子体灯丝电子温度上限从约1 eV增加到约3 eV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Determination of 915-MHz Atmospheric Pressure Air Microwave Plasma Torch (MPT) Parameters
The gas temperature, electron temperature, and electron density are critical parameters that affect microwave plasma chemistry processes in industrial applications. Using optical emission spectroscopy (OES), the gas temperature and electron density of a 915-MHz atmospheric pressure air microwave plasma torch (MPT) were investigated at various absorbed power levels and radial positions. In addition, the variation in the electron temperatures of 915-MHz atmospheric pressure argon microwave plasma filaments was analyzed as a function of the absorbed power. The experimental results showed that: 1) the absorbed power had little effect on the radial gas temperature or electron density; 2) the skin effect was present in the 915-MHz atmospheric pressure air MPT, where it causing caused hollowing in the center of the radial gas temperature distribution; 3) the electron density reached approximately $2\times10$ 13 cm−3 and was almost insensitive to variations in the absorbed power in the center of the 915-MHz atmospheric pressure air MPT; and 4) the upper limit of the 915-MHz atmospheric pressure microwave plasma filament electron temperature increased from approximately 1 to approximately 3 eV as the absorbed power increased from 2.0 to 6.3 kW.
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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