{"title":"利用T.E.S.T和机器学习评估抗生素光催化降解过程中的毒性变化","authors":"Qiaoyu Zhang , Qiao Shen , Fumin Peng , Wenjing Bian , Xu Huang , Yong Zhang , Jian Huang , Hua Zhang , Tao Luo","doi":"10.1016/j.mssp.2025.110129","DOIUrl":null,"url":null,"abstract":"<div><div>This study selected Doxycycline hydrochloride (DOX) as a representative antibiotic and titanium dioxide nanoparticles (P25) as a typical photocatalyst to investigate the photocatalytic degradation process. The research demonstrates three key innovations: (1) The degradation pathway of DOX by P25 was systematically elucidated through the combination of in situ reactive oxygen species (ROS) verification (confirming the dominant roles of <sup>1</sup>O<sub>2</sub>, •O<sub>2</sub><sup>-</sup>, and h<sup>+</sup>) and multi-technique intermediate tracking using liquid chromatography-mass spectrometry/two-dimensional correlation spectroscopy (LC-MS/2D-COS). This approach confirmed the direct involvement of <sup>1</sup>O<sub>2</sub>, •O<sub>2</sub><sup>-</sup>, and h<sup>+</sup> in the reaction and resolved the sequence of functional group changes. (2) A random forest (RF) model was developed and integrated with T.E.S.T. simulations to construct time-resolved toxicity evolution profiles. The acute toxicity, developmental toxicity, and mutagenicity of intermediates were evaluated using the T.E.S.T. toxicity assessment software. The established RF model demonstrated high prediction accuracy with a coefficient of determination (R<sup>2</sup>) of 0.932, mean absolute error (MAE) of 0.018, and root mean square error (RMSE) of 0.039. This model enables tracking of photocatalytic intermediate variations and, combined with toxicity simulation, facilitates the prediction of toxicity levels at different degradation stages, thereby deriving toxicity evolution patterns after photocatalytic degradation. (3) This study establishes a novel framework for degradation endpoint optimization through dynamic toxicity prediction, providing a strategic solution for minimizing ecological risks in photocatalytic water treatment.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"202 ","pages":"Article 110129"},"PeriodicalIF":4.6000,"publicationDate":"2025-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Assessment of toxicity changes during photocatalytic degradation of antibiotics using T.E.S.T and machine learning\",\"authors\":\"Qiaoyu Zhang , Qiao Shen , Fumin Peng , Wenjing Bian , Xu Huang , Yong Zhang , Jian Huang , Hua Zhang , Tao Luo\",\"doi\":\"10.1016/j.mssp.2025.110129\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This study selected Doxycycline hydrochloride (DOX) as a representative antibiotic and titanium dioxide nanoparticles (P25) as a typical photocatalyst to investigate the photocatalytic degradation process. The research demonstrates three key innovations: (1) The degradation pathway of DOX by P25 was systematically elucidated through the combination of in situ reactive oxygen species (ROS) verification (confirming the dominant roles of <sup>1</sup>O<sub>2</sub>, •O<sub>2</sub><sup>-</sup>, and h<sup>+</sup>) and multi-technique intermediate tracking using liquid chromatography-mass spectrometry/two-dimensional correlation spectroscopy (LC-MS/2D-COS). This approach confirmed the direct involvement of <sup>1</sup>O<sub>2</sub>, •O<sub>2</sub><sup>-</sup>, and h<sup>+</sup> in the reaction and resolved the sequence of functional group changes. (2) A random forest (RF) model was developed and integrated with T.E.S.T. simulations to construct time-resolved toxicity evolution profiles. The acute toxicity, developmental toxicity, and mutagenicity of intermediates were evaluated using the T.E.S.T. toxicity assessment software. The established RF model demonstrated high prediction accuracy with a coefficient of determination (R<sup>2</sup>) of 0.932, mean absolute error (MAE) of 0.018, and root mean square error (RMSE) of 0.039. This model enables tracking of photocatalytic intermediate variations and, combined with toxicity simulation, facilitates the prediction of toxicity levels at different degradation stages, thereby deriving toxicity evolution patterns after photocatalytic degradation. (3) This study establishes a novel framework for degradation endpoint optimization through dynamic toxicity prediction, providing a strategic solution for minimizing ecological risks in photocatalytic water treatment.</div></div>\",\"PeriodicalId\":18240,\"journal\":{\"name\":\"Materials Science in Semiconductor Processing\",\"volume\":\"202 \",\"pages\":\"Article 110129\"},\"PeriodicalIF\":4.6000,\"publicationDate\":\"2025-10-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Science in Semiconductor Processing\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1369800125008674\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800125008674","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Assessment of toxicity changes during photocatalytic degradation of antibiotics using T.E.S.T and machine learning
This study selected Doxycycline hydrochloride (DOX) as a representative antibiotic and titanium dioxide nanoparticles (P25) as a typical photocatalyst to investigate the photocatalytic degradation process. The research demonstrates three key innovations: (1) The degradation pathway of DOX by P25 was systematically elucidated through the combination of in situ reactive oxygen species (ROS) verification (confirming the dominant roles of 1O2, •O2-, and h+) and multi-technique intermediate tracking using liquid chromatography-mass spectrometry/two-dimensional correlation spectroscopy (LC-MS/2D-COS). This approach confirmed the direct involvement of 1O2, •O2-, and h+ in the reaction and resolved the sequence of functional group changes. (2) A random forest (RF) model was developed and integrated with T.E.S.T. simulations to construct time-resolved toxicity evolution profiles. The acute toxicity, developmental toxicity, and mutagenicity of intermediates were evaluated using the T.E.S.T. toxicity assessment software. The established RF model demonstrated high prediction accuracy with a coefficient of determination (R2) of 0.932, mean absolute error (MAE) of 0.018, and root mean square error (RMSE) of 0.039. This model enables tracking of photocatalytic intermediate variations and, combined with toxicity simulation, facilitates the prediction of toxicity levels at different degradation stages, thereby deriving toxicity evolution patterns after photocatalytic degradation. (3) This study establishes a novel framework for degradation endpoint optimization through dynamic toxicity prediction, providing a strategic solution for minimizing ecological risks in photocatalytic water treatment.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.