催化降解刚果红和恩诺沙星的直接z型光催化剂CaAl2O4/Bi2O3的制备

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Ancy Kurian, Shanmugam Sumathi
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引用次数: 0

摘要

由于水体中染料和抗生素等有机污染物的存在日益增加,迫切需要有效和可持续的修复策略。在这项研究中,通过对单个母材的直接固态研磨方法,成功合成了一种新型的CaAl2O4/Bi2O3复合光催化剂。CaAl2O4和Bi2O3之间的紧密界面促进了直接的Z-scheme异质结形成,增强了电荷分离,同时保持了活性氧生成的强氧化还原电位。该催化剂在紫外和可见光照射下对刚果红染料和恩诺沙星抗生素均有良好的降解性能。在90 min内对刚果红的降解效率为96.5%,180 min内对恩诺沙星的降解效率为82.6%。捕获实验确定了超氧自由基和空穴是负责污染物降解的主要反应物质。该催化剂在不同污染物类型中表现出强大的活性,强调了其多功能性和实际废水处理的潜力。这些发现为通过简单的合成路线合理设计直接z型光催化剂提供了有价值的见解,并突出了复合材料解决复杂环境污染的前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Facile fabrication of CaAl2O4/Bi2O3: A direct Z-scheme photocatalyst for enhanced photocatalytic degradation of congo red and enrofloxacin

Facile fabrication of CaAl2O4/Bi2O3: A direct Z-scheme photocatalyst for enhanced photocatalytic degradation of congo red and enrofloxacin
Due to the increasing presence of organic pollutants such as dyes and antibiotics in water bodies, there is a pressing need for efficient and sustainable remediation strategies. In this study, a novel CaAl2O4/Bi2O3 composite photocatalyst was successfully synthesized via a straightforward solid-state grinding method of the individual parent materials. The close interface between CaAl2O4 and Bi2O3 facilitated direct Z-scheme heterojunction formation, enhancing charge separation while preserving strong redox potential for reactive oxygen species generation. The catalyst demonstrated excellent degradation performance against both congo red dye and enrofloxacin antibiotic under UV and visible light irradiation. Specifically, the composite achieved a degradation efficiency of 96.5 % for congo red within 90 min and 82.6 % for enrofloxacin within 180 min. Trapping experiments identified superoxide radicals and holes as the primary reactive species responsible for pollutant degradation. The catalyst exhibited robust activity across different pollutant types, underscoring its versatility and potential for practical wastewater treatment. These findings provide valuable insights into the rational design of direct Z-scheme photocatalysts through simple synthesis routes and highlight the composites promise for addressing complex environmental contamination.
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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