等离子体物理中具有时变系数的（3 + 1）维扩展Jimbo-Miwa方程的可积性和新周期解、扭转-反扭转解和复多孤子解

IF 1.5 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2025-09-23 DOI:10.1109/TPS.2025.3605238

M. J. Rahaman;S. Saha Ray

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引用次数: 0

摘要

本文给出了（$3+1$）维扩展Jimbo-Miwa （JM）方程时变系数的精确解。通过painlevel分析方法证明了所考虑的方程是完全可积的。使用painlev分析方法导出的Laurent级数被截断以产生auto-Bäcklund变换（ABT），并使用该方法构造解析解。通过ABT有效地生成了三种新的解析解，并利用简化的Hirota方法得到了该方程的多孤子解。通过各种函数和参数设置，所有的测定结果都以三维图形的形式显示出来。这些图表反映了所研究方程的物理意义。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Integrability and New Periodic, Kink–Antikink, and Complex Multiple Soliton Solutions to the (3 + 1)-Dimensional Extended Jimbo–Miwa Equation With Time-Dependent Variable Coefficients in Plasma Physics

This article presents the exact solutions for the time-dependent variable coefficients of the (

$3+1$

)-dimensional extended Jimbo–Miwa (JM) equation. The considered equation is demonstrated to be completely integrable via the Painlevé analysis method. The Laurent series, derived using the Painlevé analysis method, has been truncated to yield an auto-Bäcklund transformation (ABT), and this method is employed to construct analytical solutions. Three new categories of analytical solutions are effectively generated for the considered equation via the ABT. Also, multi-soliton solutions are obtained using the simplified Hirota method for the equation under consideration. All the determined results are illustrated in 3-D graphs through various functions and parameter settings. These graphs reflect the physical significance of the equation being studied.

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.