G. Vinuesa , T. del Val , K. Kalam , H. García , M.B. González , F. Campabadal , S. Dueñas , H. Castán
{"title":"设置和重置动态对HfO2, Al2O3和双层记忆电阻器的影响","authors":"G. Vinuesa , T. del Val , K. Kalam , H. García , M.B. González , F. Campabadal , S. Dueñas , H. Castán","doi":"10.1016/j.sse.2025.109262","DOIUrl":null,"url":null,"abstract":"<div><div>In this study, resistive switching in three structures with HfO<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>, Al<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>O<span><math><msub><mrow></mrow><mrow><mn>3</mn></mrow></msub></math></span>, and bilayer (HfO<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span> + Al<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>O<span><math><msub><mrow></mrow><mrow><mn>3</mn></mrow></msub></math></span>) oxides is studied. Electrical characterization reveals differences in switching dynamics and performance across these configurations, highlighting the impact of oxide composition and structure on device behavior. The time needed to reset is defined and studied in detail, showing an exponential dependence with the applied voltage. Finally, an initial assessment of the effect that the set and reset transient has on the multilevel capabilities of the devices is made.</div></div>","PeriodicalId":21909,"journal":{"name":"Solid-state Electronics","volume":"230 ","pages":"Article 109262"},"PeriodicalIF":1.4000,"publicationDate":"2025-10-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effect of set and reset dynamics on HfO2, Al2O3, and bilayer memristors\",\"authors\":\"G. Vinuesa , T. del Val , K. Kalam , H. García , M.B. González , F. Campabadal , S. Dueñas , H. Castán\",\"doi\":\"10.1016/j.sse.2025.109262\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>In this study, resistive switching in three structures with HfO<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>, Al<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>O<span><math><msub><mrow></mrow><mrow><mn>3</mn></mrow></msub></math></span>, and bilayer (HfO<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span> + Al<span><math><msub><mrow></mrow><mrow><mn>2</mn></mrow></msub></math></span>O<span><math><msub><mrow></mrow><mrow><mn>3</mn></mrow></msub></math></span>) oxides is studied. Electrical characterization reveals differences in switching dynamics and performance across these configurations, highlighting the impact of oxide composition and structure on device behavior. The time needed to reset is defined and studied in detail, showing an exponential dependence with the applied voltage. Finally, an initial assessment of the effect that the set and reset transient has on the multilevel capabilities of the devices is made.</div></div>\",\"PeriodicalId\":21909,\"journal\":{\"name\":\"Solid-state Electronics\",\"volume\":\"230 \",\"pages\":\"Article 109262\"},\"PeriodicalIF\":1.4000,\"publicationDate\":\"2025-10-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Solid-state Electronics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0038110125002072\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid-state Electronics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0038110125002072","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Effect of set and reset dynamics on HfO2, Al2O3, and bilayer memristors
In this study, resistive switching in three structures with HfO, AlO, and bilayer (HfO + AlO) oxides is studied. Electrical characterization reveals differences in switching dynamics and performance across these configurations, highlighting the impact of oxide composition and structure on device behavior. The time needed to reset is defined and studied in detail, showing an exponential dependence with the applied voltage. Finally, an initial assessment of the effect that the set and reset transient has on the multilevel capabilities of the devices is made.
期刊介绍:
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.