电容耦合射频氩等离子体的研究:原位光学诊断与数据驱动和理论建模的集成

IF 2.5 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Sharona Atlas, Shani Har Lavan, Amir Kaplan, Avi Lehrer, Illya Rozenberg, Hao Zhao, Joshua H. Baraban
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引用次数: 0

摘要

我们利用实验、数据驱动和理论建模技术相结合的方法来研究非热等离子体的特性和观测数据,包括光学发射光谱强度、电子温度、物质浓度、电离程度和反应速率。作为一个案例研究,我们使用光学发射光谱(OES)测量了低压状态下氩气的等离子体特性,同时改变了等离子体输入功率和气体流速。我们使用数据驱动和漂移扩散建模技术来获得互补信息,包括电子温度、电场和物种密度。计算的激发氩密度数与测量的发射强度呈线性相关,并且我们发现对Ar I强度的主要影响因素是施加功率,其次是气体流量(或压力)(分别为77%和20%)。电子温度随功率增加而增加,但随流量(或压力)降低。结合测量和建模结果有助于了解冷等离子体动力学和化学更复杂的等离子体化学应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of Capacitively Coupled Radio-Frequency Argon Plasma: Integration of in Situ Optical Diagnostics with Data-Driven and Theoretical Modeling

We utilized a combination of experimental alongside data-driven and theoretical modelling techniques to study non-thermal plasma properties and observables including optical emission spectral intensities, electron temperature, species concentrations, degree of ionization, and reaction rates. As a case study we measured the plasma properties of Argon gas in the low-pressure regime using optical emission spectroscopy (OES) while varying plasma input power and gas flow rate. We used data-driven and drift-diffusion modeling techniques to obtain complementary information, including electron temperature, reduced electric field, and species densities. The calculated density number of excited argon has a linear correlation to measured emission intensity, and we found that the dominant effect on Ar I intensity is the applied power with the gas flow (or pressure) the secondary factor (77% and 20%, respectively). The electron temperature increases with power but decreases with flow (or pressure). Combining the measured and modelling results help to understand the cold plasma dynamics and chemistry towards more complex plasma chemistry applications.

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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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