Sharona Atlas, Shani Har Lavan, Amir Kaplan, Avi Lehrer, Illya Rozenberg, Hao Zhao, Joshua H. Baraban
{"title":"电容耦合射频氩等离子体的研究:原位光学诊断与数据驱动和理论建模的集成","authors":"Sharona Atlas, Shani Har Lavan, Amir Kaplan, Avi Lehrer, Illya Rozenberg, Hao Zhao, Joshua H. Baraban","doi":"10.1007/s11090-025-10563-2","DOIUrl":null,"url":null,"abstract":"<div><p>We utilized a combination of experimental alongside data-driven and theoretical modelling techniques to study non-thermal plasma properties and observables including optical emission spectral intensities, electron temperature, species concentrations, degree of ionization, and reaction rates. As a case study we measured the plasma properties of Argon gas in the low-pressure regime using optical emission spectroscopy (OES) while varying plasma input power and gas flow rate. We used data-driven and drift-diffusion modeling techniques to obtain complementary information, including electron temperature, reduced electric field, and species densities. The calculated density number of excited argon has a linear correlation to measured emission intensity, and we found that the dominant effect on Ar I intensity is the applied power with the gas flow (or pressure) the secondary factor (77% and 20%, respectively). The electron temperature increases with power but decreases with flow (or pressure). Combining the measured and modelling results help to understand the cold plasma dynamics and chemistry towards more complex plasma chemistry applications.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"45 4","pages":"1261 - 1292"},"PeriodicalIF":2.5000,"publicationDate":"2025-04-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-025-10563-2.pdf","citationCount":"0","resultStr":"{\"title\":\"Investigation of Capacitively Coupled Radio-Frequency Argon Plasma: Integration of in Situ Optical Diagnostics with Data-Driven and Theoretical Modeling\",\"authors\":\"Sharona Atlas, Shani Har Lavan, Amir Kaplan, Avi Lehrer, Illya Rozenberg, Hao Zhao, Joshua H. Baraban\",\"doi\":\"10.1007/s11090-025-10563-2\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>We utilized a combination of experimental alongside data-driven and theoretical modelling techniques to study non-thermal plasma properties and observables including optical emission spectral intensities, electron temperature, species concentrations, degree of ionization, and reaction rates. As a case study we measured the plasma properties of Argon gas in the low-pressure regime using optical emission spectroscopy (OES) while varying plasma input power and gas flow rate. We used data-driven and drift-diffusion modeling techniques to obtain complementary information, including electron temperature, reduced electric field, and species densities. The calculated density number of excited argon has a linear correlation to measured emission intensity, and we found that the dominant effect on Ar I intensity is the applied power with the gas flow (or pressure) the secondary factor (77% and 20%, respectively). The electron temperature increases with power but decreases with flow (or pressure). Combining the measured and modelling results help to understand the cold plasma dynamics and chemistry towards more complex plasma chemistry applications.</p></div>\",\"PeriodicalId\":734,\"journal\":{\"name\":\"Plasma Chemistry and Plasma Processing\",\"volume\":\"45 4\",\"pages\":\"1261 - 1292\"},\"PeriodicalIF\":2.5000,\"publicationDate\":\"2025-04-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://link.springer.com/content/pdf/10.1007/s11090-025-10563-2.pdf\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Plasma Chemistry and Plasma Processing\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s11090-025-10563-2\",\"RegionNum\":3,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, CHEMICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Chemistry and Plasma Processing","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s11090-025-10563-2","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, CHEMICAL","Score":null,"Total":0}
Investigation of Capacitively Coupled Radio-Frequency Argon Plasma: Integration of in Situ Optical Diagnostics with Data-Driven and Theoretical Modeling
We utilized a combination of experimental alongside data-driven and theoretical modelling techniques to study non-thermal plasma properties and observables including optical emission spectral intensities, electron temperature, species concentrations, degree of ionization, and reaction rates. As a case study we measured the plasma properties of Argon gas in the low-pressure regime using optical emission spectroscopy (OES) while varying plasma input power and gas flow rate. We used data-driven and drift-diffusion modeling techniques to obtain complementary information, including electron temperature, reduced electric field, and species densities. The calculated density number of excited argon has a linear correlation to measured emission intensity, and we found that the dominant effect on Ar I intensity is the applied power with the gas flow (or pressure) the secondary factor (77% and 20%, respectively). The electron temperature increases with power but decreases with flow (or pressure). Combining the measured and modelling results help to understand the cold plasma dynamics and chemistry towards more complex plasma chemistry applications.
期刊介绍:
Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.