As和Se共掺Ge2Sb2Te5相变记忆薄膜的相演化研究

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Shahin Parveen , Nidhi Bhatt , Abdul Whab , Motiur Rahman Khan , Fouran Singh , Pumlianmunga
{"title":"As和Se共掺Ge2Sb2Te5相变记忆薄膜的相演化研究","authors":"Shahin Parveen ,&nbsp;Nidhi Bhatt ,&nbsp;Abdul Whab ,&nbsp;Motiur Rahman Khan ,&nbsp;Fouran Singh ,&nbsp;Pumlianmunga","doi":"10.1016/j.mssp.2025.110095","DOIUrl":null,"url":null,"abstract":"<div><div>In this work, the structural, electrical, electro-thermal, and switching properties of As<sub>2</sub>Se<sub>3</sub>-doped Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub> films have been studied. Upon annealing, the films undergo a phase transition at higher temperatures from the amorphous state to a stable hexagonal phase via a metastable face-centered-cubic phase, notably without any observed phase separation and lattice distortion. Doping with As<sub>2</sub>Se<sub>3</sub> significantly improves the thermal stability of the amorphous phase, increasing the crystallization temperature from ⁓168 °C to ⁓225 °C (x = 0.21). The band gap is increased due to the formation of high-energetic Ge-Se and As-Se bonds. Furthermore, the data retention temperature for a 10-year period is substantially improved from 78 °C to 124.93 °C with a corresponding increase in the activation energy. The threshold current required for phase transformation is reduced to 0.23 mA. Higher-doped films generate more Joule heat due to their increased resistivity, which, in turn, allows for a reduction in power consumption for the same applied current, indicating promising applications in phase change memory devices.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"201 ","pages":"Article 110095"},"PeriodicalIF":4.6000,"publicationDate":"2025-09-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Explicating the phase evolution in As and Se co-doped Ge2Sb2Te5 films for phase change memory\",\"authors\":\"Shahin Parveen ,&nbsp;Nidhi Bhatt ,&nbsp;Abdul Whab ,&nbsp;Motiur Rahman Khan ,&nbsp;Fouran Singh ,&nbsp;Pumlianmunga\",\"doi\":\"10.1016/j.mssp.2025.110095\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>In this work, the structural, electrical, electro-thermal, and switching properties of As<sub>2</sub>Se<sub>3</sub>-doped Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub> films have been studied. Upon annealing, the films undergo a phase transition at higher temperatures from the amorphous state to a stable hexagonal phase via a metastable face-centered-cubic phase, notably without any observed phase separation and lattice distortion. Doping with As<sub>2</sub>Se<sub>3</sub> significantly improves the thermal stability of the amorphous phase, increasing the crystallization temperature from ⁓168 °C to ⁓225 °C (x = 0.21). The band gap is increased due to the formation of high-energetic Ge-Se and As-Se bonds. Furthermore, the data retention temperature for a 10-year period is substantially improved from 78 °C to 124.93 °C with a corresponding increase in the activation energy. The threshold current required for phase transformation is reduced to 0.23 mA. Higher-doped films generate more Joule heat due to their increased resistivity, which, in turn, allows for a reduction in power consumption for the same applied current, indicating promising applications in phase change memory devices.</div></div>\",\"PeriodicalId\":18240,\"journal\":{\"name\":\"Materials Science in Semiconductor Processing\",\"volume\":\"201 \",\"pages\":\"Article 110095\"},\"PeriodicalIF\":4.6000,\"publicationDate\":\"2025-09-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Science in Semiconductor Processing\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1369800125008339\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800125008339","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

摘要

本文研究了as2se3掺杂Ge2Sb2Te5薄膜的结构、电学、电热和开关性能。退火后,薄膜在高温下通过亚稳面心立方相从非晶态转变为稳定的六方相,特别是没有观察到任何相分离和晶格畸变。As2Se3的掺杂显著提高了非晶相的热稳定性,晶化温度从⁓168℃提高到⁓225℃(x = 0.21)。由于形成了高能的Ge-Se和As-Se键,带隙增大。此外,10年的数据保留温度从78°C大幅提高到124.93°C,活化能相应增加。相变所需的阈值电流降低到0.23 mA。高掺杂薄膜由于其电阻率增加而产生更多的焦耳热,这反过来又允许在相同的施加电流下降低功耗,这表明在相变存储器件中有很好的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Explicating the phase evolution in As and Se co-doped Ge2Sb2Te5 films for phase change memory
In this work, the structural, electrical, electro-thermal, and switching properties of As2Se3-doped Ge2Sb2Te5 films have been studied. Upon annealing, the films undergo a phase transition at higher temperatures from the amorphous state to a stable hexagonal phase via a metastable face-centered-cubic phase, notably without any observed phase separation and lattice distortion. Doping with As2Se3 significantly improves the thermal stability of the amorphous phase, increasing the crystallization temperature from ⁓168 °C to ⁓225 °C (x = 0.21). The band gap is increased due to the formation of high-energetic Ge-Se and As-Se bonds. Furthermore, the data retention temperature for a 10-year period is substantially improved from 78 °C to 124.93 °C with a corresponding increase in the activation energy. The threshold current required for phase transformation is reduced to 0.23 mA. Higher-doped films generate more Joule heat due to their increased resistivity, which, in turn, allows for a reduction in power consumption for the same applied current, indicating promising applications in phase change memory devices.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信