{"title":"As和Se共掺Ge2Sb2Te5相变记忆薄膜的相演化研究","authors":"Shahin Parveen , Nidhi Bhatt , Abdul Whab , Motiur Rahman Khan , Fouran Singh , Pumlianmunga","doi":"10.1016/j.mssp.2025.110095","DOIUrl":null,"url":null,"abstract":"<div><div>In this work, the structural, electrical, electro-thermal, and switching properties of As<sub>2</sub>Se<sub>3</sub>-doped Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub> films have been studied. Upon annealing, the films undergo a phase transition at higher temperatures from the amorphous state to a stable hexagonal phase via a metastable face-centered-cubic phase, notably without any observed phase separation and lattice distortion. Doping with As<sub>2</sub>Se<sub>3</sub> significantly improves the thermal stability of the amorphous phase, increasing the crystallization temperature from ⁓168 °C to ⁓225 °C (x = 0.21). The band gap is increased due to the formation of high-energetic Ge-Se and As-Se bonds. Furthermore, the data retention temperature for a 10-year period is substantially improved from 78 °C to 124.93 °C with a corresponding increase in the activation energy. The threshold current required for phase transformation is reduced to 0.23 mA. Higher-doped films generate more Joule heat due to their increased resistivity, which, in turn, allows for a reduction in power consumption for the same applied current, indicating promising applications in phase change memory devices.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"201 ","pages":"Article 110095"},"PeriodicalIF":4.6000,"publicationDate":"2025-09-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Explicating the phase evolution in As and Se co-doped Ge2Sb2Te5 films for phase change memory\",\"authors\":\"Shahin Parveen , Nidhi Bhatt , Abdul Whab , Motiur Rahman Khan , Fouran Singh , Pumlianmunga\",\"doi\":\"10.1016/j.mssp.2025.110095\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>In this work, the structural, electrical, electro-thermal, and switching properties of As<sub>2</sub>Se<sub>3</sub>-doped Ge<sub>2</sub>Sb<sub>2</sub>Te<sub>5</sub> films have been studied. Upon annealing, the films undergo a phase transition at higher temperatures from the amorphous state to a stable hexagonal phase via a metastable face-centered-cubic phase, notably without any observed phase separation and lattice distortion. Doping with As<sub>2</sub>Se<sub>3</sub> significantly improves the thermal stability of the amorphous phase, increasing the crystallization temperature from ⁓168 °C to ⁓225 °C (x = 0.21). The band gap is increased due to the formation of high-energetic Ge-Se and As-Se bonds. Furthermore, the data retention temperature for a 10-year period is substantially improved from 78 °C to 124.93 °C with a corresponding increase in the activation energy. The threshold current required for phase transformation is reduced to 0.23 mA. Higher-doped films generate more Joule heat due to their increased resistivity, which, in turn, allows for a reduction in power consumption for the same applied current, indicating promising applications in phase change memory devices.</div></div>\",\"PeriodicalId\":18240,\"journal\":{\"name\":\"Materials Science in Semiconductor Processing\",\"volume\":\"201 \",\"pages\":\"Article 110095\"},\"PeriodicalIF\":4.6000,\"publicationDate\":\"2025-09-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Science in Semiconductor Processing\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1369800125008339\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800125008339","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Explicating the phase evolution in As and Se co-doped Ge2Sb2Te5 films for phase change memory
In this work, the structural, electrical, electro-thermal, and switching properties of As2Se3-doped Ge2Sb2Te5 films have been studied. Upon annealing, the films undergo a phase transition at higher temperatures from the amorphous state to a stable hexagonal phase via a metastable face-centered-cubic phase, notably without any observed phase separation and lattice distortion. Doping with As2Se3 significantly improves the thermal stability of the amorphous phase, increasing the crystallization temperature from ⁓168 °C to ⁓225 °C (x = 0.21). The band gap is increased due to the formation of high-energetic Ge-Se and As-Se bonds. Furthermore, the data retention temperature for a 10-year period is substantially improved from 78 °C to 124.93 °C with a corresponding increase in the activation energy. The threshold current required for phase transformation is reduced to 0.23 mA. Higher-doped films generate more Joule heat due to their increased resistivity, which, in turn, allows for a reduction in power consumption for the same applied current, indicating promising applications in phase change memory devices.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.