基于杂化功能的取代掺杂GaSe单层膜的研究:电子、光电和光催化应用

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Mohamed M. Fadlallah , Safwat Abdel-Azeim
{"title":"基于杂化功能的取代掺杂GaSe单层膜的研究:电子、光电和光催化应用","authors":"Mohamed M. Fadlallah ,&nbsp;Safwat Abdel-Azeim","doi":"10.1016/j.mssp.2025.110068","DOIUrl":null,"url":null,"abstract":"<div><div>GaSe monolayer suffers in electronic and photocatalytic applications due to its large bandgap (3.50 eV). In this study, we employed the hybrid density functional, the Heyd-Scuseria-Ernzerhof hybrid (HSE), to explore the effect of substitutional metal single doping (M = Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ge, As, In, Sn, Sb) at the Ga-site on the structural stability, electronic, magnetic, optical, and photocatalytic properties. Our findings indicate that the bond lengths M-Ga/Se increase as the atomic radius of the dopant increases. Most of the doped structures are found to be thermodynamically stable. The introduction of metal and non-metal dopants significantly alters the magnetic properties of GaSe nanosheets, with dopings of Ti, V, Cr, Mn, Fe, Ni, and Co, as well as Zn, resulting in diluted magnetic semiconductors. In contrast, dopings with Sc, Cu, As, In, and Sb maintained semiconductor characteristics. The As- and Sb-doping resulted in the narrowest bandgap of 2.1 eV, while Ge- and Sn-doped GaSe monolayers revealed promise for two-dimensional spintronic applications. Although most dopants enhanced visible-light absorption, many proved unsuitable for photocatalysis due to the created mid-gap states and unfavorable valence band edges. The study showed that V-doped GaSe monolayer is a promising two-dimensional material for photocatalytic water-splitting and CO<sub>2</sub> reduction under visible light, making it a potential material for clean fuel production.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"201 ","pages":"Article 110068"},"PeriodicalIF":4.6000,"publicationDate":"2025-09-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Study on substitutional doped GaSe monolayers using hybrid functional: Electronic, optoelectronic, and photocatalytic applications\",\"authors\":\"Mohamed M. Fadlallah ,&nbsp;Safwat Abdel-Azeim\",\"doi\":\"10.1016/j.mssp.2025.110068\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>GaSe monolayer suffers in electronic and photocatalytic applications due to its large bandgap (3.50 eV). In this study, we employed the hybrid density functional, the Heyd-Scuseria-Ernzerhof hybrid (HSE), to explore the effect of substitutional metal single doping (M = Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ge, As, In, Sn, Sb) at the Ga-site on the structural stability, electronic, magnetic, optical, and photocatalytic properties. Our findings indicate that the bond lengths M-Ga/Se increase as the atomic radius of the dopant increases. Most of the doped structures are found to be thermodynamically stable. The introduction of metal and non-metal dopants significantly alters the magnetic properties of GaSe nanosheets, with dopings of Ti, V, Cr, Mn, Fe, Ni, and Co, as well as Zn, resulting in diluted magnetic semiconductors. In contrast, dopings with Sc, Cu, As, In, and Sb maintained semiconductor characteristics. The As- and Sb-doping resulted in the narrowest bandgap of 2.1 eV, while Ge- and Sn-doped GaSe monolayers revealed promise for two-dimensional spintronic applications. Although most dopants enhanced visible-light absorption, many proved unsuitable for photocatalysis due to the created mid-gap states and unfavorable valence band edges. The study showed that V-doped GaSe monolayer is a promising two-dimensional material for photocatalytic water-splitting and CO<sub>2</sub> reduction under visible light, making it a potential material for clean fuel production.</div></div>\",\"PeriodicalId\":18240,\"journal\":{\"name\":\"Materials Science in Semiconductor Processing\",\"volume\":\"201 \",\"pages\":\"Article 110068\"},\"PeriodicalIF\":4.6000,\"publicationDate\":\"2025-09-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Science in Semiconductor Processing\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1369800125008054\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800125008054","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

摘要

由于其大带隙(3.50 eV), GaSe单层在电子和光催化应用中受到影响。在本研究中,我们采用杂化密度泛函Heyd-Scuseria-Ernzerhof杂化(HSE),探讨了取代金属单掺杂(M = Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ge, As, In, Sn, Sb)在ga位点对结构稳定性、电子、磁性、光学和光催化性能的影响。我们的研究结果表明,随着掺杂剂原子半径的增加,M-Ga/Se的键长增加。大多数掺杂结构都是热力学稳定的。金属和非金属掺杂剂的引入显著改变了GaSe纳米片的磁性能,掺杂了Ti、V、Cr、Mn、Fe、Ni和Co以及Zn,导致磁性半导体被稀释。相反,Sc、Cu、As、In和Sb的掺杂保持了半导体特性。As-和sb掺杂的GaSe单层带隙最小,为2.1 eV,而Ge和sn掺杂的GaSe单层显示出二维自旋电子应用的前景。虽然大多数掺杂剂增强了可见光吸收,但由于产生了中间隙状态和不利的价带边缘,许多掺杂剂被证明不适合光催化。研究表明,v掺杂的GaSe单层是一种很有前途的二维材料,可以在可见光下光催化分解水和还原CO2,是清洁燃料生产的潜在材料。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study on substitutional doped GaSe monolayers using hybrid functional: Electronic, optoelectronic, and photocatalytic applications
GaSe monolayer suffers in electronic and photocatalytic applications due to its large bandgap (3.50 eV). In this study, we employed the hybrid density functional, the Heyd-Scuseria-Ernzerhof hybrid (HSE), to explore the effect of substitutional metal single doping (M = Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ge, As, In, Sn, Sb) at the Ga-site on the structural stability, electronic, magnetic, optical, and photocatalytic properties. Our findings indicate that the bond lengths M-Ga/Se increase as the atomic radius of the dopant increases. Most of the doped structures are found to be thermodynamically stable. The introduction of metal and non-metal dopants significantly alters the magnetic properties of GaSe nanosheets, with dopings of Ti, V, Cr, Mn, Fe, Ni, and Co, as well as Zn, resulting in diluted magnetic semiconductors. In contrast, dopings with Sc, Cu, As, In, and Sb maintained semiconductor characteristics. The As- and Sb-doping resulted in the narrowest bandgap of 2.1 eV, while Ge- and Sn-doped GaSe monolayers revealed promise for two-dimensional spintronic applications. Although most dopants enhanced visible-light absorption, many proved unsuitable for photocatalysis due to the created mid-gap states and unfavorable valence band edges. The study showed that V-doped GaSe monolayer is a promising two-dimensional material for photocatalytic water-splitting and CO2 reduction under visible light, making it a potential material for clean fuel production.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信