大功率脉冲驱动源的电磁干扰分析、建模与抑制

IF 1.5 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2025-07-28 DOI:10.1109/TPS.2025.3585722

Ruiheng Zhang;Yuzhang Yuan;Haitao Wang;XueJun Pei;Jin Meng

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引用次数: 0

摘要

在大功率脉冲驱动（HPPD）源中，脉冲形成网络Marx （PFN-Marx）产生超快的瞬态过电压，具有陡峭的上升沿和延伸到100mhz的宽频谱。瞬态干扰可以通过电缆传播到敏感电路或通过空间辐射，影响附近的设备。为了解决现有电磁干扰（EMI）模型和测试标准在准确表征超快瞬态干扰时频特征方面的局限性，本研究系统地研究了HPPD系统中干扰源的特征。提出了一种集成干扰源的创新建模方法，从而建立了一种利用衰减阻尼振荡波的新型瞬态干扰模型。该模型有效地捕捉了超快速瞬态干扰的特征，为不同类型HPPD系统的电磁干扰预测和分析提供了一个通用工具。该研究为大功率脉冲系统二次设备的电磁兼容设计提供了重要的理论指导，极大地提高了二次设备在恶劣电磁条件下的可靠性和安全性。

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Electromagnetic Interference Analysis, Modeling, and Suppression of High-Power Pulse Drive Source

In high-power pulse drive (HPPD) sources, the pulse forming network Marx (PFN-Marx) generates ultra-fast transient overvoltages with steep rising edges and a broad frequency spectrum extending to 100 MHz. Transient interference can propagate via cables into sensitive circuits or radiate through space, impacting nearby equipment. To address the limitations of existing electromagnetic interference (EMI) models and testing standards in accurately characterizing the time–frequency features of ultra-fast transient disturbances, this study systematically investigates the characteristics of interference sources within HPPD systems. The innovative modeling approach integrating interference sources is proposed, leading to the development of a novel transient interference model utilizing attenuated damped oscillation waves. This model effectively captures the characteristics of ultra-fast transient interference and provides a versatile tool for EMI prediction and analysis across different types of HPPD systems. The study offers essential theoretical guidance for electromagnetic compatibility (EMC) design of secondary equipment in high-power pulse systems, greatly enhancing their reliability and safety under challenging electromagnetic conditions.

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.