Lida Yuan;Xiaocun Guan;Shaohua Guan;Duolin Shi;Jingbin Shi
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Research on Influence Factors of Armature Levitation Force in Single-Stage Electromagnetic Induction Coil Launcher
Gravity-induced misalignment in the electromagnetic induction coil launcher (EICL) causes the armature to deviate, leading to unbalanced forces and potential collisions in the launch tube. To mitigate this issue, a study has been conducted to explore the factors influencing armature levitation force in the EICL. This scholarly work presents a mathematical model of levitation force, developed using current filament methods, and substantiates its accuracy through rigorous validation. A methodology has been proposed to assess the levitation force of the armature in EICL, focusing on two key aspects: the peak value of the levitation force and the time required to achieve this peak. By altering one or multiple system parameters of the EICL, an analysis of the levitation force variation patterns has been performed. A comprehensive synthesis has been conducted to elucidate the impact of systemic parameter variations on the armature levitation force in electromagnetic induction coil systems. The application of dynamic and electromagnetic coupling levitation simulation has been extended to the EICL, offering guidance for subsequent design principles related to emission control, as well as armature and tube structures.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.