氧存在与Mg加入对InZnO:Al和InZnMgO:Al薄膜相互作用的研究

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Takumi Yoneda , Dwinanri Egyna , Takayuki Negami , Takashi Minemoto
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引用次数: 0

摘要

研究了氧含量和Mg掺入量对射频溅射法制备掺铝铟氧化锌(IZO:Al)和掺铝铟锌氧化镁(IZMO:Al)薄膜性能的影响。溅射过程中增加氧含量显著降低载流子浓度,导致吸收边红移和光学带隙缩小,这主要归因于带隙重整化效应占主导地位,而不是Burstein-Moss效应。同时,氧的掺入提高了近红外透过率。Mg的掺入最初改善了载流子的迁移率,但进一步增加导致迁移率降低和片材阻力增加。这些发现强调了氧含量与Mg掺入之间的复杂相互作用,显著影响了IZO:Al和IZMO:Al薄膜的电学和光学性能。优化这些参数对于实现高透明度、低电阻率和合适的带对准的平衡至关重要,这对于它们作为透明导电氧化物在串联太阳能电池等高效半导体器件中的应用至关重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of the interplay of oxygen presence and Mg addition on InZnO:Al and InZnMgO:Al Thin Films
This study investigated the influence of oxygen content and Mg incorporation on the properties of Al-doped Indium Zinc Oxide (IZO:Al) and Al-doped Indium Zinc Magnesium Oxide (IZMO:Al) thin films deposited by radio-frequency sputtering. Increasing oxygen content during sputtering significantly reduced carrier concentration, leading to a redshift in the absorption edge and a narrowing of the optical band gap, primarily attributed to the dominance of the band gap renormalization effect vs the Burstein-Moss effect. Simultaneously, oxygen incorporation enhanced near-infrared transmittance. Mg incorporation initially improved carrier mobility but further increases led to decreased mobility and increased sheet resistance. These findings highlight the complex interplay between oxygen content and Mg incorporation, significantly influencing the electrical and optical properties of IZO:Al and IZMO:Al films. Optimizing these parameters is crucial for achieving a balance of high transparency, low resistivity, and suitable band alignment, essential for their application as transparent conductive oxides in high-efficiency semiconductor devices such as tandem solar cells.
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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