Lisa Tondelli , Andries J. Scholten , Thanh Viet Dinh , Luca Selmi
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Layout effects on the thermal metrics of multichannel FinFETs
FinFET technology is widely used for advanced digital, RF, and analog applications due to its high performance and scalability. However, the non-planar architecture introduces increased electrical parasitics and self-heating effects (SHEs), which can degrade device reliability and performance.
We analyze, by simulation, the thermal behavior of four FinFET layouts designed with realistic process rules, focusing on transistor channels at the boundary of the large FinFET arrays required by RF applications. The findings highlight key thermal trade-offs of FinFET structures and suggest ways to balance static and dynamic self-heating for optimum performance and limited overtemperature.
期刊介绍:
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.