探索cs掺杂ZnO薄膜的厚度相关物理性质

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Hasan B. Albargi , Abanoub Awad , Ahmed El-Himily , Ahmed A. Aboud
{"title":"探索cs掺杂ZnO薄膜的厚度相关物理性质","authors":"Hasan B. Albargi ,&nbsp;Abanoub Awad ,&nbsp;Ahmed El-Himily ,&nbsp;Ahmed A. Aboud","doi":"10.1016/j.tsf.2025.140790","DOIUrl":null,"url":null,"abstract":"<div><div>In this study, we investigate the influence of film thickness on the properties of cesium (Cs)-doped zinc oxide (ZnO) thin films fabricated via spray pyrolysis. By varying the thickness from 305 nanometers (nm) to 677 nm, we consistently formed a hexagonal ZnO phase across all samples. The crystallite size varied from 51 nm to 58.13 nm, indicating a nuanced relationship between thickness and structural properties. Field emission scanning electron microscopy (FE-SEM) revealed diverse grain size distributions, which are critical for optimizing film performance. From optical measurements, the band gap values were all around 3.26 ± 0.01 electronvolts (eV), while the refractive index decreased significantly from 2.3 to 1.7 with increasing thickness and fixed Cs nominal content at 5 wt percent (wt%). Employing the Spitzer-Fan model, we observed a consistent reduction in high-frequency dielectric constant (ε<sub>∞</sub>) from 3.3 to 2.89 as thickness increased, highlighting changes in electronic properties. Importantly, electrical conductivity (σ) exhibited a remarkable increase from 0.0053 ohm⁻¹ meter⁻¹ to 0.044 ohm⁻¹ meter⁻¹ with increasing thickness, suggesting enhanced charge transport properties crucial for optoelectronic applications. Correspondingly, activation energy (E<sub>a</sub>) was found to vary between 0.25 eV and 0.415 eV, indicating significant thermal sensitivity across the studied thickness range. Furthermore, ultraviolet (UV) performance under 365 nm illumination showed substantial variations in rise and decay times correlated with film thickness; minimum rise times were recorded at 5.08 s for the 305 nm film, while minimum decay times reached 68.86 s for the 400 nm film. These findings underscore the potential for tailoring ZnO thin films to optimize performance in optoelectronic applications, demonstrating a strong initial impact through quantifiable enhancements in material properties.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"828 ","pages":"Article 140790"},"PeriodicalIF":2.0000,"publicationDate":"2025-09-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Exploring thickness-dependent physical properties in Cs-doped ZnO thin films\",\"authors\":\"Hasan B. Albargi ,&nbsp;Abanoub Awad ,&nbsp;Ahmed El-Himily ,&nbsp;Ahmed A. Aboud\",\"doi\":\"10.1016/j.tsf.2025.140790\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>In this study, we investigate the influence of film thickness on the properties of cesium (Cs)-doped zinc oxide (ZnO) thin films fabricated via spray pyrolysis. By varying the thickness from 305 nanometers (nm) to 677 nm, we consistently formed a hexagonal ZnO phase across all samples. The crystallite size varied from 51 nm to 58.13 nm, indicating a nuanced relationship between thickness and structural properties. Field emission scanning electron microscopy (FE-SEM) revealed diverse grain size distributions, which are critical for optimizing film performance. From optical measurements, the band gap values were all around 3.26 ± 0.01 electronvolts (eV), while the refractive index decreased significantly from 2.3 to 1.7 with increasing thickness and fixed Cs nominal content at 5 wt percent (wt%). Employing the Spitzer-Fan model, we observed a consistent reduction in high-frequency dielectric constant (ε<sub>∞</sub>) from 3.3 to 2.89 as thickness increased, highlighting changes in electronic properties. Importantly, electrical conductivity (σ) exhibited a remarkable increase from 0.0053 ohm⁻¹ meter⁻¹ to 0.044 ohm⁻¹ meter⁻¹ with increasing thickness, suggesting enhanced charge transport properties crucial for optoelectronic applications. Correspondingly, activation energy (E<sub>a</sub>) was found to vary between 0.25 eV and 0.415 eV, indicating significant thermal sensitivity across the studied thickness range. Furthermore, ultraviolet (UV) performance under 365 nm illumination showed substantial variations in rise and decay times correlated with film thickness; minimum rise times were recorded at 5.08 s for the 305 nm film, while minimum decay times reached 68.86 s for the 400 nm film. These findings underscore the potential for tailoring ZnO thin films to optimize performance in optoelectronic applications, demonstrating a strong initial impact through quantifiable enhancements in material properties.</div></div>\",\"PeriodicalId\":23182,\"journal\":{\"name\":\"Thin Solid Films\",\"volume\":\"828 \",\"pages\":\"Article 140790\"},\"PeriodicalIF\":2.0000,\"publicationDate\":\"2025-09-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Thin Solid Films\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0040609025001890\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, COATINGS & FILMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0040609025001890","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0

摘要

在本研究中,我们研究了薄膜厚度对喷雾热解法制备铯(Cs)掺杂氧化锌(ZnO)薄膜性能的影响。通过改变厚度从305纳米(nm)到677纳米,我们在所有样品中一致地形成了六边形ZnO相。晶粒尺寸从51 nm到58.13 nm不等,表明厚度与结构性能之间存在微妙的关系。场发射扫描电镜(FE-SEM)显示了不同的晶粒尺寸分布,这是优化薄膜性能的关键。光学测量表明,带隙值均在3.26±0.01电子伏(eV)左右,而折射率随厚度的增加和Cs标称含量固定在5 wt% (wt%)时从2.3下降到1.7。利用Spitzer-Fan模型,我们观察到随着厚度的增加,高频介电常数(ε∞)从3.3持续降低到2.89,突出了电子特性的变化。重要的是,随着厚度的增加,导电率(σ)从0.0053欧姆(⁻¹米)增加到0.044欧姆(⁻¹米),这表明增强的电荷传输特性对光电应用至关重要。相应地,发现活化能(Ea)在0.25 eV和0.415 eV之间变化,表明在研究的厚度范围内具有显著的热敏性。此外,在365 nm光照下,紫外(UV)性能随膜厚的增加和衰减时间有显著变化;305 nm薄膜的最小上升时间为5.08 s, 400 nm薄膜的最小衰减时间为68.86 s。这些发现强调了定制ZnO薄膜以优化光电应用性能的潜力,通过可量化的材料性能增强展示了强大的初始影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Exploring thickness-dependent physical properties in Cs-doped ZnO thin films
In this study, we investigate the influence of film thickness on the properties of cesium (Cs)-doped zinc oxide (ZnO) thin films fabricated via spray pyrolysis. By varying the thickness from 305 nanometers (nm) to 677 nm, we consistently formed a hexagonal ZnO phase across all samples. The crystallite size varied from 51 nm to 58.13 nm, indicating a nuanced relationship between thickness and structural properties. Field emission scanning electron microscopy (FE-SEM) revealed diverse grain size distributions, which are critical for optimizing film performance. From optical measurements, the band gap values were all around 3.26 ± 0.01 electronvolts (eV), while the refractive index decreased significantly from 2.3 to 1.7 with increasing thickness and fixed Cs nominal content at 5 wt percent (wt%). Employing the Spitzer-Fan model, we observed a consistent reduction in high-frequency dielectric constant (ε) from 3.3 to 2.89 as thickness increased, highlighting changes in electronic properties. Importantly, electrical conductivity (σ) exhibited a remarkable increase from 0.0053 ohm⁻¹ meter⁻¹ to 0.044 ohm⁻¹ meter⁻¹ with increasing thickness, suggesting enhanced charge transport properties crucial for optoelectronic applications. Correspondingly, activation energy (Ea) was found to vary between 0.25 eV and 0.415 eV, indicating significant thermal sensitivity across the studied thickness range. Furthermore, ultraviolet (UV) performance under 365 nm illumination showed substantial variations in rise and decay times correlated with film thickness; minimum rise times were recorded at 5.08 s for the 305 nm film, while minimum decay times reached 68.86 s for the 400 nm film. These findings underscore the potential for tailoring ZnO thin films to optimize performance in optoelectronic applications, demonstrating a strong initial impact through quantifiable enhancements in material properties.
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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