Jiong Liu , Sheng Han , Yu Zhang , Jingxuan Wei , Bojia Chen , Runzhou Li , Pei Yan , Jiangquan Kuang , Xinming Wu , Xuefeng Wu , Rongxu Bai , David W. Zhang , Qingqing Sun , Li Ji , Shen Hu
{"title":"通过等离子体增强原子层沉积的可调谐掺铪InZnO薄膜晶体管","authors":"Jiong Liu , Sheng Han , Yu Zhang , Jingxuan Wei , Bojia Chen , Runzhou Li , Pei Yan , Jiangquan Kuang , Xinming Wu , Xuefeng Wu , Rongxu Bai , David W. Zhang , Qingqing Sun , Li Ji , Shen Hu","doi":"10.1016/j.mssp.2025.110039","DOIUrl":null,"url":null,"abstract":"<div><div>Hafnium-doped InZnO (HIZO) thin film transistors (TFTs) were successfully fabricated via plasma-enhanced atomic layer deposition (PEALD) at low temperature (180 °C) for the first time, omitting the annealing process. Concretely, we adjusted the device performance by modulating the doping concentration of hafnium (Hf) cations and the oxygen vacancy content. The optimal 6.25 % doping content was determined. Based on this optimization, the HIZO TFTs exhibited an excellent field-effect mobility (<em>μ</em><sub><em>FE</em></sub>) of 21.7 cm<sup>2</sup>/V·s, a low threshold voltage (<em>V</em><sub><em>th</em></sub>) of ∼0.1 V, a minimum subthreshold swing (<em>SS</em>) of 69 mV/decade and a fantastic <em>I</em><sub><em>on</em></sub><em>/I</em><sub><em>off</em></sub> of exceeding 10<sup>8</sup> utilizing the hafnium oxide (HfO<sub>2</sub>) dielectric, which was one of the state-of-the-art performances among HIZO TFTs reported to date. Meanwhile, an excellent bias stability under both positive and negative bias stress was achieved. The favorable performance can be attributed to the effective suppression of overabundant oxygen vacancies and the passivation of defects at the channel–dielectric interface by Hf doping. The Hall effect measurement and X-ray photoelectron spectroscopy (XPS) further corroborate the ability to inhibit carrier concentration by Hf addition. This study presents a novel strategy for achieving excellent HIZO TFTs, holding promise for the next-generation high-performance display domain.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"201 ","pages":"Article 110039"},"PeriodicalIF":4.6000,"publicationDate":"2025-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Tunable hafnium-doped InZnO thin film transistors via plasma-enhanced atomic layer deposition\",\"authors\":\"Jiong Liu , Sheng Han , Yu Zhang , Jingxuan Wei , Bojia Chen , Runzhou Li , Pei Yan , Jiangquan Kuang , Xinming Wu , Xuefeng Wu , Rongxu Bai , David W. Zhang , Qingqing Sun , Li Ji , Shen Hu\",\"doi\":\"10.1016/j.mssp.2025.110039\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Hafnium-doped InZnO (HIZO) thin film transistors (TFTs) were successfully fabricated via plasma-enhanced atomic layer deposition (PEALD) at low temperature (180 °C) for the first time, omitting the annealing process. Concretely, we adjusted the device performance by modulating the doping concentration of hafnium (Hf) cations and the oxygen vacancy content. The optimal 6.25 % doping content was determined. Based on this optimization, the HIZO TFTs exhibited an excellent field-effect mobility (<em>μ</em><sub><em>FE</em></sub>) of 21.7 cm<sup>2</sup>/V·s, a low threshold voltage (<em>V</em><sub><em>th</em></sub>) of ∼0.1 V, a minimum subthreshold swing (<em>SS</em>) of 69 mV/decade and a fantastic <em>I</em><sub><em>on</em></sub><em>/I</em><sub><em>off</em></sub> of exceeding 10<sup>8</sup> utilizing the hafnium oxide (HfO<sub>2</sub>) dielectric, which was one of the state-of-the-art performances among HIZO TFTs reported to date. Meanwhile, an excellent bias stability under both positive and negative bias stress was achieved. The favorable performance can be attributed to the effective suppression of overabundant oxygen vacancies and the passivation of defects at the channel–dielectric interface by Hf doping. The Hall effect measurement and X-ray photoelectron spectroscopy (XPS) further corroborate the ability to inhibit carrier concentration by Hf addition. This study presents a novel strategy for achieving excellent HIZO TFTs, holding promise for the next-generation high-performance display domain.</div></div>\",\"PeriodicalId\":18240,\"journal\":{\"name\":\"Materials Science in Semiconductor Processing\",\"volume\":\"201 \",\"pages\":\"Article 110039\"},\"PeriodicalIF\":4.6000,\"publicationDate\":\"2025-09-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Science in Semiconductor Processing\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1369800125007760\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800125007760","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Tunable hafnium-doped InZnO thin film transistors via plasma-enhanced atomic layer deposition
Hafnium-doped InZnO (HIZO) thin film transistors (TFTs) were successfully fabricated via plasma-enhanced atomic layer deposition (PEALD) at low temperature (180 °C) for the first time, omitting the annealing process. Concretely, we adjusted the device performance by modulating the doping concentration of hafnium (Hf) cations and the oxygen vacancy content. The optimal 6.25 % doping content was determined. Based on this optimization, the HIZO TFTs exhibited an excellent field-effect mobility (μFE) of 21.7 cm2/V·s, a low threshold voltage (Vth) of ∼0.1 V, a minimum subthreshold swing (SS) of 69 mV/decade and a fantastic Ion/Ioff of exceeding 108 utilizing the hafnium oxide (HfO2) dielectric, which was one of the state-of-the-art performances among HIZO TFTs reported to date. Meanwhile, an excellent bias stability under both positive and negative bias stress was achieved. The favorable performance can be attributed to the effective suppression of overabundant oxygen vacancies and the passivation of defects at the channel–dielectric interface by Hf doping. The Hall effect measurement and X-ray photoelectron spectroscopy (XPS) further corroborate the ability to inhibit carrier concentration by Hf addition. This study presents a novel strategy for achieving excellent HIZO TFTs, holding promise for the next-generation high-performance display domain.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
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Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.