氧化石墨烯/壳聚糖层状双氢氧化物用于染料脱色、析氧反应和杀菌失活

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Kinza Asif , Muhammad Imran , Anum Shahzadi , Farzana Jamal , Sarmad Frogh Arshad , Anwar Ul-Hamid , Ahmed M. Fouda , Muhammad Ikram
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引用次数: 0

摘要

本研究采用共沉淀法合成了氧化石墨烯(GO)和壳聚糖(CS)改性锌/铝(ZnAl)层状双氢氧化物(LDH)。研究目的是抑制原始ZnAl的电子/空穴对重组率,提高催化降解染料、析氧反应(OER)和抗菌活性的多功能效能。此外,通过先进的技术表征了掺杂剂对结构、形貌和光学特性的影响。XRD分析结果表明,该材料呈菱形结构,掺杂后晶粒尺寸增大。TEM显微照片证实了有序排列的二维纳米片与GO/CS-ZnAl的分层组装。结果表明,在碱性介质中,罗丹明B (rhodamine B, RhB)染料的最佳降解率为92.0%,在各种环境净化中具有潜在的应用前景。在所有样品中,3% GO/CS-ZnAl LDH显示出较低的过电位,最低的Tafel斜率和最小的Rct值,表明OER活性最高。此外,还对CS-ZnAl LDH与GO/CS-ZnAl纳米复合杀菌剂进行对接研究,考察其对金黄色葡萄球菌二氢叶酸还原酶(DHFR)和脱氧核糖核酸(DNA)旋切酶的潜在抑制作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Graphene oxide/chitosan-layered double hydroxides for dye decolorization, oxygen evolution reaction and bactericidal inactivation
In this research, graphene oxide (GO) and chitosan (CS) modified zinc/Aluminum (ZnAl) layered doubled hydroxide (LDH) were synthesized via co-precipitation. The research objective was to suppress the electron/hole pair recombination rate of pristine ZnAl and enhance the multifunctional effectiveness of catalytic degradation of dye, oxygen evolution reaction (OER), and antibacterial activity. Additionally, the influence of dopants on structure, morphology, and optical characteristics was characterized by advanced techniques. XRD revealed the rhombohedral structure and enhancement in crystallite size was observed with doping. TEM micrographs endorsed regularly aligned two-dimensional nanosheets with the layered assembly of GO/CS-ZnAl. Furthermore, catalysis results suggested an optimum rhodamine B (RhB) dye degradation rate of 92.0 % in a basic medium, which signifies its potential application in various environmental decontamination. Among all samples, 3 % GO/CS-ZnAl LDH revealed a lower overpotential, the lowest Tafel slope, and minimal Rct value, suggesting the highest OER activity. Moreover, the docking studies of CS-ZnAl LDH and GO/CS-ZnAl nanocomposites bactericidal agents were conducted to investigate their potential inhibition of dihydrofolate reductase (DHFR) and deoxyribonucleic acid (DNA) gyrase enzymes in S. aureus.
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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