侧向β-Ga2O3 MOSFET器件的4a / 300v开关

IF 4.5 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Kornelius Tetzner;Houssam Halhoul;Martin Damian Cuallo;Oliver Hilt
{"title":"侧向β-Ga2O3 MOSFET器件的4a / 300v开关","authors":"Kornelius Tetzner;Houssam Halhoul;Martin Damian Cuallo;Oliver Hilt","doi":"10.1109/LED.2025.3590836","DOIUrl":null,"url":null,"abstract":"This work reports on the high-voltage switching performance of lateral <inline-formula> <tex-math>$\\beta $ </tex-math></inline-formula>-Ga2O3 MOSFET devices, emphasizing dynamic behavior under kilowatt-class operating conditions. Large-periphery devices with a total gate width of 92 mm were characterized using pulsed I-V and transient switching measurements. Pulsed output characteristics revealed a peak drain current of 13 A – the highest reported for a <inline-formula> <tex-math>$\\beta $ </tex-math></inline-formula>-Ga2O3 transistor—alongside an on-resistance of 720 m<inline-formula> <tex-math>$\\Omega $ </tex-math></inline-formula>. High-voltage switching transients were captured using on-wafer measurements and the devices were subjected to off-state drain voltages up to 350 V. The measured on-state drain current degraded from 8.5 A to 2.5 A as the off-state drain voltage increased from 10 V to 350 V, corresponding to a fourfold increase of the dynamic on-state resistance. This degradation is attributed to charge trapping at interface states or within the channel, possibly related to Fe-doping or implantation-induced defects. The observed switching dispersion correlates with low channel mobility and underscores the importance of optimizing the process technology as well as material quality. Nevertheless, the characterization of switching transients at 4 A / 300 V demonstrates the first kilowatt-class switching operation in <inline-formula> <tex-math>$\\beta $ </tex-math></inline-formula>-Ga2O3 power transistors, underscoring their potential for next-generation power electronics applications.","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":"46 9","pages":"1601-1604"},"PeriodicalIF":4.5000,"publicationDate":"2025-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"4 A/300 V Switching of Lateral β-Ga2O3 MOSFET Devices\",\"authors\":\"Kornelius Tetzner;Houssam Halhoul;Martin Damian Cuallo;Oliver Hilt\",\"doi\":\"10.1109/LED.2025.3590836\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This work reports on the high-voltage switching performance of lateral <inline-formula> <tex-math>$\\\\beta $ </tex-math></inline-formula>-Ga2O3 MOSFET devices, emphasizing dynamic behavior under kilowatt-class operating conditions. Large-periphery devices with a total gate width of 92 mm were characterized using pulsed I-V and transient switching measurements. Pulsed output characteristics revealed a peak drain current of 13 A – the highest reported for a <inline-formula> <tex-math>$\\\\beta $ </tex-math></inline-formula>-Ga2O3 transistor—alongside an on-resistance of 720 m<inline-formula> <tex-math>$\\\\Omega $ </tex-math></inline-formula>. High-voltage switching transients were captured using on-wafer measurements and the devices were subjected to off-state drain voltages up to 350 V. The measured on-state drain current degraded from 8.5 A to 2.5 A as the off-state drain voltage increased from 10 V to 350 V, corresponding to a fourfold increase of the dynamic on-state resistance. This degradation is attributed to charge trapping at interface states or within the channel, possibly related to Fe-doping or implantation-induced defects. The observed switching dispersion correlates with low channel mobility and underscores the importance of optimizing the process technology as well as material quality. Nevertheless, the characterization of switching transients at 4 A / 300 V demonstrates the first kilowatt-class switching operation in <inline-formula> <tex-math>$\\\\beta $ </tex-math></inline-formula>-Ga2O3 power transistors, underscoring their potential for next-generation power electronics applications.\",\"PeriodicalId\":13198,\"journal\":{\"name\":\"IEEE Electron Device Letters\",\"volume\":\"46 9\",\"pages\":\"1601-1604\"},\"PeriodicalIF\":4.5000,\"publicationDate\":\"2025-07-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Electron Device Letters\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/11087203/\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Device Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/11087203/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

摘要

这项工作报告了横向$\beta $ -Ga2O3 MOSFET器件的高压开关性能,强调了在千瓦级工作条件下的动态行为。采用脉冲I-V和瞬态开关测量对总栅极宽度为92 mm的大外围器件进行了表征。脉冲输出特性显示出13 a的峰值漏极电流,这是$\beta $ - ga2o3晶体管的最高记录,导通电阻为720 m $\Omega $。使用晶片上测量捕获高压开关瞬态,器件受到高达350 V的断开状态漏极电压。当失态漏极电压从10 V增加到350 V时,测量到的导通漏极电流从8.5 A下降到2.5 A,对应于动态导通电阻增加了四倍。这种退化归因于界面态或通道内的电荷捕获,可能与fe掺杂或植入引起的缺陷有关。观察到的开关色散与低通道迁移率相关,强调了优化工艺技术和材料质量的重要性。然而,4 A / 300 V开关瞬态的特性证明了$\beta $ -Ga2O3功率晶体管的第一个千瓦级开关操作,强调了它们在下一代电力电子应用中的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
4 A/300 V Switching of Lateral β-Ga2O3 MOSFET Devices
This work reports on the high-voltage switching performance of lateral $\beta $ -Ga2O3 MOSFET devices, emphasizing dynamic behavior under kilowatt-class operating conditions. Large-periphery devices with a total gate width of 92 mm were characterized using pulsed I-V and transient switching measurements. Pulsed output characteristics revealed a peak drain current of 13 A – the highest reported for a $\beta $ -Ga2O3 transistor—alongside an on-resistance of 720 m $\Omega $ . High-voltage switching transients were captured using on-wafer measurements and the devices were subjected to off-state drain voltages up to 350 V. The measured on-state drain current degraded from 8.5 A to 2.5 A as the off-state drain voltage increased from 10 V to 350 V, corresponding to a fourfold increase of the dynamic on-state resistance. This degradation is attributed to charge trapping at interface states or within the channel, possibly related to Fe-doping or implantation-induced defects. The observed switching dispersion correlates with low channel mobility and underscores the importance of optimizing the process technology as well as material quality. Nevertheless, the characterization of switching transients at 4 A / 300 V demonstrates the first kilowatt-class switching operation in $\beta $ -Ga2O3 power transistors, underscoring their potential for next-generation power electronics applications.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
IEEE Electron Device Letters
IEEE Electron Device Letters 工程技术-工程:电子与电气
CiteScore
8.20
自引率
10.20%
发文量
551
审稿时长
1.4 months
期刊介绍: IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信