IEEE Electron Device Letters

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5106

中科院SCI期刊分区 WOS期刊分区历年影响因子历年发表投稿信息同类期刊

英文名称：

IEEE Electron Device Letters

期刊缩写：

IEEE Electron Device Lett.

影响因子：

4.1

ISSN：

print: 0741-3106

研究领域：

工程技术-工程：电子与电气

创刊年份：

1980年

h-index：

135

自引率：

10.20%

Gold OA文章占比：

4.62%

原创研究文献占比：

100.00%

SCI收录类型：

Science Citation Index Expanded (SCIE) || Scopus (CiteScore)

期刊官网：

http://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=55

期刊介绍英文：

IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.

CiteScore：

CiteScore	SJR	SNIP	CiteScore排名
8.2	1.250	1.500	学科排名百分位大类：Engineering 小类：Electrical and Electronic Engineering 128 / 797 84% 大类：Materials Science 小类：Electronic, Optical and Magnetic Materials 51 / 284 82%